International Business Machines Corporation

Globalfoundries Inc.

Kevin W McCullen

Robert F Walker

Jason D Hibbeler

Xin Yuan

Rani Narayan

Fook-Luen Heng

Robert J Allen

Michael S Gray

Matthew Thomas Guzowski

Cam V Endicott

Gustavo Enrique Tellez

Stephen Larry Runyon

Xiaoping Tang

Lars W Liebmann

Daniel Nelson Maynard

Leon Jacob Sigal

Alexey Y Lvov

Ivan L Wemple

Alexander Ivrii

Evanthia Papadopoulou

Henry A Bonges, Iii

Mervyn Y Tan

Sarah C Braasch

Steven G Lovejoy

Veit Gernhoefer

Pieter J Woeltgens

Xiaoyun K Wu

Sriram Peri

Michael Gester

Methods of the present disclosure can include: using a computing device to perform actions including: applying a design rule check (DRC) on a proposed integrated circuit (IC) layout, wherein the DRC applies a set of restrictive design rules (RDRs) in response to the proposed IC layout being a contact area (CA) layout; computing a conflict graph for the proposed IC layout in response to one of the IC layout being a metal layer layout and the set of RDRs being satisfied; determining whether the IC layout is one of non-colorable, indeterminate, partially colorable, and fully colorable; and partially coloring the IC layout and identifying non-colorable nodes in response to the IC layout being indeterminate or partially colorable.

Reducing color conflicts in triple patterning lithography

Approaches are provided for fixing pin mismatches from swapping library cells in layout migration. Specifically, a method is provided that includes collecting information about a first technology pin from a library cell in a first technology. The method further includes swapping the library cell in the first technology with a library cell in a second technology. The method further includes collecting information about a second technology pin from the library cell in the second technology. The method further includes building a pin-mapping table that is configured to map the first technology pin to the second technology pin. The method further includes scaling a layout from the first technology to the second technology. The method further includes modifying the layout based on the pin-mapping table to match the at least one first technology pin to the at least one second technology pin while satisfying ground rules of the second technology.

Systems and methods for fixing pin mismatch in layout migration

A method, system, and computer program product for informing a user of purchase information in an online purchase situation are disclosed. In one embodiment, a method includes determining whether an activation device indicator is within a predetermined proximity of a purchase-initiating button in a web browser; and initiating a tip message displaying the purchase information including at least one of: an historical balance, an existing balance, an available amount of credit, or a payment method.

Purchase information notification system, method, and program product

A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet 'edge coverage' requirements.

Technology migration for integrated circuits with radical design restrictions

A method of laying out features for alternating aperture phase shift masks. The method includes defining features on a grid of a uniform basic pitch, orienting the features such that those of the features defined, at least in part, by phase shifting shapes are oriented along a primary direction, and spacing two features terminating adjacent one another such that the two features have space between them sufficient to prevent phase conflicts if both of the two features are defined, at least in part, by phase shifting shapes.

Methods and systems for layout and routing using alternating aperture phase shift masks

An adaptive weighting method for layout optimization differentiates different priorities by assigning the weight of a higher priority (p) to be multiple of the weight of a lower priority (p) where W(p)=m% W(p. To avoid numerical imprecision, this method keeps the total cost in the objective function within a trustable range by scaling the initial weights in the objectives, while maintaining relativity, to produce the scaled weights.

Adaptive weighting method for layout optimization with multiple priorities

The invention includes a solution for selectively scaling an integrated circuit (IC) design by: layer, region or cell, or a combination of these. The selective scaling technique can be applied in a feedback loop with the manufacturing system with process and yield feedback, during the life of a design, to increase yield in early processes in such a way that hierarchy is preserved. The invention removes the need to involve designers in improving yield.

Integrated circuit selective scaling

A method, apparatus, and computer program product for visually indicating the interaction between one or more edges of a design that contribute to a defined critical area pattern.

Method, apparatus, and computer program product for displaying and modifying the critical area of an integrated circuit design

A method, system and program product for context aware sub-circuit layout modification are disclosed. The method may include defining at least one context for the sub-circuit for each circuit that uses the sub-circuit; in the case that a plurality of contexts are defined, minimizing a number of contexts for the sub-circuit by combining contexts into at least one stage; placing each stage into a staged layout; and modifying the sub-circuit by modifying the staged layout.

Context aware sub-circuit layout modification

A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. Also, a method, system and program product for migrating an integrated circuit design from a source technology without RDR to a target technology with RDR in which space may be reserved for late insertion of a feature and in which migration first occurs in a primary compaction direction having less tolerant ground rules.

Methods of independently migrating a hierarchical design are disclosed. A method for migrating a macro in an integrated circuit comprises: determining an interface strategy between a base cell in the macro and the macro, the base cell including an interface element involved in the interface strategy; migrating the base cell independently with respect to the macro based on the interface strategy; initially scaling the macro; swapping the migrated base cell into the macro; and legalizing content of the initially scaled macro.

Independent migration of hierarchical designs with methods of finding and fixing opens during migration

Method, system and program product for migrating an integrated circuit (IC) layout for, for example, alternating aperture phase shift masks (AltPSM), are disclosed. In order to migrate a layout to phase compliance, jogs are identified on a first (AltPSM) layer and shifted to another second layer. Isolated or clustered jogs are shifted into an open channel portions on the second layer where possible. Remaining clustered jogs are shifted into as few new channels as possible on the second layer. The jog removal process leaves unidirectional wires that can be trivially phase colored. Standard technology migration techniques are then used to legalize the results on the layers.

Migration of integrated circuit layout for alternating phase shift masks

A method comprises extracting a hierarchical grid constraint set and modeling one or more critical objects of at least one cell as a variable set. The method further comprises solving a linear programming problem based on the hierarchical grid constraint set with the variable set to provide initial locations of the critical objects of the at least one cell and determining target on-grid locations of the one or more critical objects in the at least one cell using the results of the linear programming solution.

Minimum layout perturbation-based artwork legalization with grid constraints for hierarchical designs

Methods for performing phase-correct layout and routing of integrated circuits using alternating aperture phase shift masks (AltPSM), including bright field AltPSM and dark field AltPSM are disclosed. Also disclosed are systems for performing phase-correct layout and routing, including computer-based routing programs and systems.

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Essex Junction, VT, United States of America

Kevin W McCullen