Asml Netherlands B.v.

Kevin Van De Ruit

Johannes Onvlee

Roy Werkman

Jochem Sebastiaan Wildenberg

Jean-Philippe Xavier Van Damme

Bart Dinand Paarhuis

Cornelis Melchior Brouwer

A method of determining a set of metrology point locations, the set including a subset of potential metrology point locations on a substrate, the method including: determining a relation between noise distributions associated with a plurality of the potential metrology point locations using existing knowledge; and using the determined relation and a model associated with the substrate to determine the set.

Method of determining a set of metrology points on a substrate, associated apparatus and computer program

A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.

Lithographic apparatus and lithographic projection method

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Eindhoven, Netherlands

Kevin Van De Ruit