Xilinx, Inc.

Kevin T Look

Shih-Cheng Hsueh

Michael J Hart

Martin L Voogel

Shahin Toutounchi

Yakov Karpovich

Kameswara K Rao

Evert A Wolsheimer

Steven P Young

Austin H Lesea

James Karp

Jan Lodewijk De Jong

Daniel Gitlin

Carl H Carmichael

Jongheon Jeong

Radko Gerard Bankras

Joseph J Fabula

Robert O Conn

Tim Tuan

Jonathan Jung-Ching Ho

An integrated circuit structure can include a plurality of solder bumps coupled in series forming a chain and a plurality of diodes, wherein each diode is coupled to one of the plurality of solder bumps. The integrated circuit structure also can include a first pad coupled to the solder bump of the plurality of solder bumps at an end of the chain. The first pad can be configured to provide a test current responsive to application of a forward bias voltage to each diode of the plurality of diodes.

Localization of failure in high density test structure

A method of operating a programmable logic device, including the steps of using a full Vsupply voltage to operate one or more active blocks of the programmable logic device, and using a reduced supply voltage (e.g., &#xbd; V) to operate one or more inactive blocks of the programmable logic device. The full VDD supply voltage and reduced supply voltage can be provided to the blocks of the programmable logic device through high-voltage n-channel transistors. A boosted voltage, greater than VDD, is applied to the gate of an n-channel transistor to provide the full VDD supply voltage to an active block. A standby voltage, less than VDD, is applied to the gate of an n-channel transistor to provide the reduced supply voltage to an inactive block. The inactive blocks can be determined during run time and/or design time of the programmable logic device.

Regulating unused/inactive resources in programmable logic devices for static power reduction

SEU-hardening series resistances loads are formed within the gate structures of cross-coupled inverters of a latch. For some embodiments, the gate contact for the input of each cross-coupled inverter has a sufficiently high resistance to provide the SEU-hardening series resistance. For other embodiments, a conductive trace layer coupled to the input of each cross-coupled inverter includes a high-resistivity portion that provides the SEU-hardening series resistance.

Single event upset in SRAM cells in FPGAs with high resistivity gate structures

A p-channel non-volatile memory (NVM) transistor is programmed by shifting the threshold voltage of the transistor. The threshold voltage is shifted by introducing a programming current to the gate electrode of the transistor, and simultaneously introducing a negative bias to the transistor. The threshold voltage of the p-channel NVM transistor is shifted in response to the negative bias condition and the heat generated by the programming current. The high temperature accelerates the threshold voltage shift. The threshold voltage shift is accompanied by an agglomeration of material in the gate electrode. The agglomeration of material in the gate electrode is an indication of the high temperature reached during programming. The threshold voltage shift of the p-channel NVM transistor is permanent.

Low voltage non-volatile memory transistor

A memory cell comprises a multilayer gate heating structure formed over a channel region between source and drain regions. The multilayer gate heating structure comprises polysilicon and metal silicide layers stacked over a similarly shaped gate oxide. When a programming voltage is applied across the metal silicide layer, there is intense localized heating. The heating causes segregation of the channel dopant atoms towards the source and drain regions, lowering the threshold voltage of the device. The heating causes carrier activation in the polysilicon layer and dopant penetration through the oxide layer into the channel region, thereby increasing the threshold voltage of the device.

Low voltage non-volatile memory cell

Described are mask-alignment detection structures that measure both the direction and extent of misalignment between layers of an integrated circuit using resistive elements for which resistance varies with misalignment in one dimension. Measurements in accordance with the invention are relatively insensitive to process variations, and the structures using to take these measurements can be formed along with other features on an integrated circuit using standard processes. One embodiment of the invention may be used to measure misalignment between two conductive layers. Other embodiments measure misalignment between diffusion regions and conductors and between diffusion regions and windows through which other diffusion regions are to be formed. A circuit in accordance with one embodiment includes row and column decoders for independently selecting mask-alignment detection structures to reduce the number of test terminals required to implement the detection structures.

Mask-alignment detection circuit in X and Y directions

An electrical alignment test structure enables monitoring and measuring misalignment between layers (or associated masks) of an IC. The alignment test structure comprises a target region and an alignment feature in different layers. The target region and the alignment feature may be formed in diffusion and polysilicon layers, respectively or in well and diffusion layers, respectively. In both embodiments, the alignment feature controls the size of a conductive channel in the target region. Misalignment can be checked by comparing channel resistance with a baseline (no misalignment) resistance. In another embodiment, the target region and alignment feature are formed in the diffusion and polysilicon layers, respectively, wherein the alignment feature controls the relative widths of the source and drain regions. Misalignment can be checked by comparing current flow with a baseline current. In another embodiment, the target and alignment regions are formed in the well and diffusion layers, respectively, to form a diode, wherein misalignment can be checked by comparing current flow through the alignment feature with a baseline current. Multiple test structures can be combined in an array in accordance with an embodiment of the invention. By configuring the test structures in two mirror-image sets, the array can measure the amount of misalignment between the well and diffusion layers.

Mask alignment structure for IC layers

Mask-alignment detection circuit in x and y directions

A reticle and pellicle that are modified to prevent ESD damage to the masking material between portions of the lithographic mask pattern on the reticle during an integrated circuit fabrication process. The modification involves providing conducting lines on the glass side of the reticle and on the surface of the pellicle to balance any buildup of electrostatic charges on those devices, thereby reducing or eliminating the induction of opposite charges onto adjacent mask pattern features on the reticle and preventing the melting and bridging of those mask pattern features and the defects caused by such melting or bridging. The conductive metal lines may have a smaller width than the smallest resolution value of the reduction lens used in the mask pattern transfer process, and may also be located outside of the focal plane of the reduction lens to avoid transfer of the images of the conductive lines onto the target semiconductor substrate during the mask pattern transfer process.

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Fremont, CA, United States of America

Kevin T Look