International Business Machines Corporation

Kevin L Holland

Leping Li

Steven G Barbee

Arnold Halperin

Rock Nadeau

William Joseph Surovic

Anne Elizabeth McGuire

Gary R Doyle

Robert B Lipori

Francis Walter Kazak

Rotary signal coupling in in-situ monitoring of a chemical-mechanical polishing process. A sensor fixed to a rotatable wafer carrier for creating a signal responsive to the chemical mechanical polishing process is coupled to a bottom half of a rotary transformer fixed to a rotating portion of the polisher. A top half of the rotary transformer, coupled to the bottom half of the rotary transformer, is fixed to a stationary portion of the polisher. The signal from the sensor is thus coupled through the rotary transformer to a process monitor.

Rotary signal coupling for chemical mechanical polishing endpoint

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Newburgh, NY, United States of America

Kevin L Holland