Other

Asml Netherlands B.v.

Kevin Kornelsen

Paul Janssen

Pieter-Jan Van Zwol

Maxim Aleksandrovich Nasalevich

Dennis De Graaf

Luc Guy Frechette

Michael Alfred Josephus Kuijken

Thijs Kater

Jan Hendrik Willem Kuntzel

Guido Salmaso

Maxime Biron

Cedric Spits

Richard Beaudry

Pascal Newby

Stephane Martel

A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.

Pellicle for EUV lithography

A manner to determine pressure (e.g. inside a vacuum package, such as a MEMS die), without prior calibration, is provided using a model and a set of one or more gauges (e.g. Pirani, thermistor, thermocouple gauges) with distinct geometries. In order to calculate pressure from the electrical measurements performed on the gauges, there are several intermediate steps and an analytical model describes each of these steps. Besides the electrical measurements, other inputs are required, such as material properties and certain dimensions, which may not be known accurately. Several different gauge geometries are proposed which can be combined in order to determine the vacuum (pressure) level without knowing the values of these inputs beforehand.

Calibration-less micro-fabricated vacuum gauge devices and method for measuring pressure

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Bromont, Canada

Kevin Kornelsen