Kla Tencor Corporation

Kla Corporation

Kevin Cummings

Christopher Sears

Xinrong Jiang

Luca Grella

Nikolai N Chubun

Sameet K Shriyan

Laurence S Hordon

Oscar G Florendo

Daniel Bui

An electron-beam device includes upper-column electron optics and lower-column electron optics. The upper-column electron optics include an aperture array to divide an electron beam into a plurality of electron beamlets. The upper-column electron optics also include a lens array with a plurality of lenses to adjust the focus of the plurality of electron beamlets. Respective lenses of the plurality of lenses are to adjust the focus of respective electron beamlets of the plurality of electron beamlets. The upper-column electron optics further include a first global lens to adjust the focus of the plurality of electron beamlets in a manner opposite to the lens array.

Systems and methods of creating multiple electron beams

Extractors and extractor systems minimize the generation of secondary electrons which interact with and degrade the primary electron beam. This can improve the performance of an electron beam system, such as a scanning electron microscope. The extractor may include a frustoconical aperture that widens as distance from the source of the electron beam increases. The entrance into the frustoconical aperture also can include a curved edge.

Extractor electrode for electron source

Growing community of inventors

Milpitas, CA, United States of America

Kevin Cummings