Cornell University

Other

Kionix, Inc.

Calient Networks, Inc.

Kevin A Shaw

Noel C MacDonald

Timothy J Davis

Scott G Adams

Gregory J Galvin

James E Moon

Sharlene A Wilson

Paul C Waldrop

Z Lisa Zhang

Scott A Miller

John Matthew Chong

Tim Davis

Russell Y Webb

Bryan Walter Reed

Seung Bok (Chris) Lee

James Scott Sutherland

John M Chong

Phillip L Hurst

Teresa Mengali

Seung (Chris) Bok Lee

Fred M Bertsch

Russel Y Webb

A wine bottle wrap for promoting the contents of the bottle, the brand, or the entity that produced or is presenting the bottle for sale. The wine bottle wrap is generally made of paper, sized and shaped to be easily wrapped around a bottle, such as a wine bottle. The paper will include printed words and drawings or other images that can both identify the contents of the bottle and provide other marketing material. In a preferred embodiment, at least some of the bottle is visible in a gap in the wrap, preferably at the bottom of the bottle.

Wine bottle protection wrap and associated marketing method

A method and apparatus are described that may be used to provide decoupled rotation of structures about different pivot points. The apparatus may include one or more fixed blades mounted to a frame or substrate, one or more movable blades mounted to each structure to be moved, and flexures on which the structures are suspended. Separate movable blades may be provided for each degree of freedom. When voltage is applied between the fixed and movable blades, the electrostatic attraction generates a force attracting movable blades toward blades that are fixed relative to the moveable blades, causing a structure to rotate about the flexures. The angle of rotation that results may be related to the size, number and spacing of the blades, the stiffness of the flexures and the magnitude of the voltage difference applied to the blades. The blades are fabricated using deep silicon etching.

Electrostatic actuator for microelectromechanical systems and methods of fabrication

Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as 'latent masking', defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as 'simultaneous multi-level etching (SMILE)', provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as &#x201c;delayed LOCOS&#x201d;, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequence that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.

Method for fabricating ESI device using smile and delayed LOCOS techniques

Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as 'latent masking', defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as 'imultaneousulti-eveltching (SMILE)', provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as &#x201c;delayed LOCOS&#x201d;, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequence that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.

Method for fabricating integrated LC/ESI device using SMILE, latent masking, and delayed LOCOS techniques

Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as &ldquo;latent masking&rdquo;, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as &ldquo;simultaneous multi-level etching (SMILE)&rdquo;, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as &ldquo;delayed LOCOS&rdquo;, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequence that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.

Method for fabricating mems and microfluidic devices using smile, latent masking, and delayed locos techniques

Methods of fabricating MEMS and microfluidic devices using latent masking technique

Electrostatic actuator for micromechanical systems

Method for fabricating LC device using latent masking and delayed LOCOS techniques

Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as &ldquo;latent masking&rdquo;, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as &ldquo; imultaneous ult - evel tching (SMILE)&rdquo;, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as &ldquo;delayed LOCOS&rdquo;, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequence that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.

Method of fabricating integrated LC/ESI device using smile, latent masking, and delayed locos techniques.

A mobile chiropractic vehicle comprising a rectangular enclosure have two opposed end walls, two opposed lateral walls, a ceiling and a floor defining an interior area; at least one axle having a pair of wheels, each on opposite ends of the axle, the at least one axle being secured transversely to the rectangular enclosure adjacent the floor to enable movement of the rectangular enclosure; a first arrangement associated with one of the two opposed end walls to transport the rectangular enclosure to selected locations; a second arrangement associated with the other of the two opposed end walls to provide handicapped access to the rectangular enclosure; and a retractable arrangement disposed between the two opposed lateral walls in a spaced relationship with the two opposed end walls to divide the interior area into a patient waiting area adjacent the second arrangement and an examining, diagnostic and adjusting area adjacent the one of the two opposed end walls when the retractable arrangement is closed and a viewing area for a multimedia chiropractic presentation projected on a screen adjacent the one of the two opposed end walls when the retractable arrangement is open.

Mobile chiropractic vehicle

Methods of fabricating microelectromechanical and microfluidic devices

Optoelectronic packaging

Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as &ldquo;latent masking&rdquo;, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as &ldquo; imultaneous ulti- vel etching (SMILE)&rdquo;, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as &ldquo;delayed LOCOS&rdquo;, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequence that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.

Method of fabricating microelectromechanical and microfluidic devices

Growing community of inventors

Ithaca, NY, United States of America

Kevin A Shaw