Taiwan Semiconductor Manufacturing Comp. Ltd.

Keui Shun Chen

Tsiao-Chen Wu

George Liu

Vencent Chang

Hsiao-Tzu Lu

The method of patterning a photosensitive layer includes providing a substrate including a first layer formed thereon, treating the substrate including the first layer with cations, forming a first photosensitive layer over the first layer, patterning the first photosensitive layer to form a first pattern, treating the first pattern with cations, forming a second photosensitive layer over the treated first pattern, patterning the second photosensitive layer to form a second pattern, and processing the first layer using the first and second patterns as a mask.

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Hsin-Chu, Taiwan

Keui Shun Chen