Asml Netherlands B.v.

Kerim Nadir

Dzmitry Labetski

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Chunguang Xia

Andrew David LaForge

Christianus Wilhelmus Johannes Berendsen

Henricus Gerardus Tegenbosch

Yue Ma

Klaus Martin Hummler

Marc Guy Langlois

Kornelis Frits Feenstra

Alexander Shatalov

Arun Johnkadaksham

Matthias Kraushaar

Maksim Loginov

Seyedmohammad Mojab

John Tom Stewart

Richard Joseph Bruls

Hendrikus Gijsbertus Schimmel

John Tom Stewart, Iv

Cristian Bogdan Craus

Rui Miguel Duarte Rodrigues Nunes

Sander Baltussen

Jan Groenewold

Christian Felix Wählisch

Chuangxin Zhao

Rui Miguel Duarte Rodriges Nunes

Pär Mårten Lukas Broman

Rui Miguel Duarte Rodreigues Nunes

An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

Guiding device and associated system

A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method

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Eindhoven, Netherlands

Kerim Nadir