Kabushiki Kaisha Toshiba

Kenya Sano

Ryoichi Ohara

Takashi Kawakubo

Takaaki Yasumoto

Kazuhiko Itaya

Naoko Yanase

Kazuhide Abe

Michihiko Nishigaki

Toshihiko Nagano

Masahiko Hasunuma

Hiroshi Toyoda

Takao Noda

Takako Motai

Hironobu Shibata

Tomio Ono

Noburu Fukushima

Shuichi Komatsu

Shingo Masuko

Yorito Kakiuchi

Takashi Watanabe

Hiroshi Yoshida

Takashi Ishigami

Katsutaro Ichihara

Koichi Watanabe

Takuma Suzuki

Keiichi Yamaguchi

Kazuhiro Eguchi

Toru Sugiyama

Nobuyuki Itoh

Tadahiro Sasaki

Mayumi Morizuka

Ryuichi Fujimoto

Yukinobu Suzuki

Hideo Hirayama

Yasuo Kohsaka

Mitsuaki Izuha

Yasuo Ebuchi

Junsei Tsutsumi

Naomi Fujioka

Michihiro Oose

Tooru Kozu

Takeshi Ookubo

Hirofumi Fujisawa

Tsutomu Shirakawa

A semiconductor device includes a monocrystalline substrate of a material which does not have a liquid phase at atmospheric pressure, and an identification mark disposed on or in the substrate comprising an amorphous region of the material or a region of the material deviated from stoichiometry.

Semiconductor device and method for manufacturing the same

According to one embodiment, a semiconductor device includes a SiC layer of a first conductivity type, a SiC region of a second conductivity type, and a conductive layer of the second conductivity type. The SiC layer of the first conductivity type has a hexagonal crystal structure. The SiC region of the second conductivity type is formed in a surface of the SiC layer. The conductive layer of the second conductivity type is provided on the SiC region and is in contact with a portion of the SiC region including SiC of a cubic crystal structure.

Semiconductor device and method for manufacturing semiconductor device

According to one embodiment, a semiconductor device includes a semiconductor layer of a first conductivity type, a first region of a second conductivity type selectively provided in a first major surface of the semiconductor layer, a second region of the second conductivity type selectively provided in the first major surface and connected to the first region, a first electrode provided in contact with the semiconductor layer and the first region, a second electrode provided in contact with the second region, and a third electrode electrically connected to a second major surface of the semiconductor layer opposite to the first major surface.

Semiconductor device

A piezoelectric thin film device includes an amorphous metal film disposed on a substrate and a piezoelectric film disposed on the amorphous metal. One of crystal axis of the piezoelectric film is aligned in a direction perpendicular to a surface of the amorphous metal.

Piezoelectric thin film device and method for manufacturing the same

A thin film piezoelectric resonator includes a substrate having a cavity; a first electrode extending over the cavity; a piezoelectric film placed on the first electrode; and a second electrode placed on the piezoelectric film, the second electrode having a periphery partially overlapping on the cavity and tapered to have an inner angle of 30 degrees or smaller defined by a part of the periphery thereof and a bottom thereof.

Thin film piezoelectric resonator and method of manufacturing the same

A thin film piezoelectric actuator comprises a driving part at least one end of which is supported by an anchor portion. The driving part includes: a piezoelectric film, a first lower electrode provided under a first region of the piezoelectric film, a second lower electrode provided under a second region different from the first region of the piezoelectric film, a first upper electrode provided opposite to the first lower electrode on the piezoelectric film, a second upper electrode provided opposite to the second lower electrode on the piezoelectric film, a first connection part that electrically connects the first lower electrode and the second upper electrode via a first via hole formed in the piezoelectric film, and a second connection part that electrically connects the second lower electrode and the first upper electrode via a second via hole formed in the piezoelectric film.

Thin film piezoelectric actuator

A thin film piezoelectric resonator includes: a substrate having a cavity; a first dielectric layer provided on the substrate to cover the cavity; a second dielectric layer provided on the substrate and disposed in a peripheral region of the cavity, and having a thickness larger than the first dielectric layer; a first electrode provided on the first dielectric layer and above the cavity; a piezoelectric layer provided on the first electrode and disposed to extend to a region on the second dielectric layer; and a second electrode provided on the piezoelectric layer and above the first electrode.

Thin film piezoelectric resonator, method of manufacturing the same, and filter including the same

A thin-film piezoelectric resonator includes a substrate, and first and second excitation portions. The substrate includes first and second cavities. The first excitation portion is disposed over the first cavity, and includes a first electrode, a first piezoelectric material and a second electrode laminated successively. An overlapping region among the first electrode, the first piezoelectric material and the second electrode defines a contour of a periphery of the first excitation portion. A first distance is defined as a distance from an end of the first excitation portion to an opening end of the first cavity. The second excitation portion is disposed over the second cavity, and includes a third electrode, a second piezoelectric material and a fourth electrode laminated successively. A second distance is defined as a distance from an end of the second excitation portion to an opening end of the second cavity and different from the first distance.

Thin-film piezoelectric resonator, filter and voltage-controlled oscillator

A thin film piezoelectric resonator includes a substrate having a cavity, and a resonance portion located on the substrate and right above the cavity. The resonance portion includes a lower electrode layer located at a side of the cavity, an upper electrode layer opposite to the lower electrode layer, and a piezoelectric thin film located between the upper electrode layer and the lower electrode layer. A side of the piezoelectric thin film and a side of the lower electrode layer are located in a common plane.

Thin film piezoelectric resonator and manufacturing process thereof

A piezoelectric thin film resonator includes a substrate in which a cavity is formed, a first electrode having a first electrode edge and partly spanning the cavity on the substrate; a piezoelectric layer placed on the first electrode, a second electrode having a second electrode edge and placed on the piezoelectric layer, a resonator unit constituted by an overlapping part of the first electrode, the piezoelectric layer, the second electrode, and the cavity; and a second lead wiring which is integral with the second electrode, extends to the substrate where the cavity is not present, and has a width larger than a part of a peripheral length of the cavity to which the second electrode edge extends. In the piezoelectric thin film resonator, a first length defined by the periphery of the first electrode of the resonator unit is larger than a second length defined by the second electrode edge of the resonator unit.

Piezoelectric thin film resonator and devices provided with the same

A film bulk acoustic-wave resonator encompasses a substrate having a cavity; a bottom electrode partially fixed to the substrate, part of the bottom electrode is mechanically suspended above the cavity; a piezoelectric layer provided on the bottom electrode; and a top electrode provided on the piezoelectric layer having crystal axes oriented along a thickness direction of the piezoelectric layer, a full width at half maximum of the distribution of the orientations of the crystal axes is smaller than or equal to about six degrees.

Film bulk acoustic-wave resonator (FBAR), filter implemented by FBARs and method for manufacturing FBAR

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Kawasaki, Japan

Kenya Sano