Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Kento Horinouchi

Hisayuki Takasu

Toru Iwaya

Atsushi Kamino

Megumi Nakamura

Sakae Koubori

A performance of a sample holderused in a charged particle beam device is improved. A shield plateis connected to a sample stand. A sample standis provided with a pressing memberthat can move in a direction perpendicular to the shield platein a state in which the pressing member is attached to the sample stand, and has a bar shape. A sample supporting memberconnected to the pressing memberis provided at a position facing the shield plate. A springis provided along an outer circumference of the pressing memberand is connected to the sample supporting memberand the sample stand

Sample holder, method for using sample holder, projection amount adjustment jig, projection amount adjustment method and charged particle beam device

The present invention relates to adjustment of a mask position by driving an R-axis of an electron microscope in order to adjust the mask position with high accuracy while performing observation by the electron microscope without providing a heat generation source inside the electron microscope. The R-axis originally exists in a sample chamber of the electron microscope, which enables control with high accuracy. The R-axis driving of a sample stage can be substituted by raster rotation, therefore, the mask position can be adjusted with high accuracy while performing observation by the electron microscope according to the present invention.

Mask position adjustment method of ion milling, electron microscope capable of adjusting mask position, mask adjustment device mounted on sample stage and sample mask component of ion milling device

Provided is a technology for suppressing a heat rise in a sample, the heat rise being generated due to ion beam irradiation at a low acceleration voltage. A blocking plate, which is different from a mask, is disposed in front of a sample. The blocking plate has an opening that overlaps a processing surface, and ion beams pass only through the opening of the blocking plate, and in the areas excluding the opening, the ion beams are blocked by the blocking plate, and the sample is not irradiated thereby. Furthermore, the heat rise in the sample is further suppressed by cooling the blocking plate.

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Tokyo, Japan

Kento Horinouchi