Canon Kabushiki Kaisha

Kentaro Sano

Masato Muraki

Akira Miyake

Yoshikiyo Yui

Go Tsuchiya

The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, including an aperture array configured to include a plurality of apertures for shaping the respective charged particle beams, a deflection unit configured to include a plurality of first deflectors which are arranged on a side, with respect to the aperture array, of a charged particle source for radiating a charged particle beam and which deflect the respective charged particle beams, and to individually change irradiated positions of the respective charged particle beams on the aperture array by driving the respective first deflectors, and a controller configured to control deflection of the charged particle beams by the first deflectors to reduce a dispersion of intensities of the respective charged particle beams on the substrate.

Drawing apparatus and method of manufacturing article

A drawing apparatus includes a first aperture array configured to split a diverging charged particle beam, a converging lens array configured to form a plurality of first crossovers of a plurality of charged particle beams from the first aperture array, a collimator lens having a principal plane where the plurality of first crossovers are to be formed, a correcting system configured to correct angles of a plurality of charged particle beams from the collimator lens and to form a plurality of second crossovers, and an element having a plurality of apertures respectively corresponding to the plurality of second crossovers. The first aperture array and the converging lens array have apertures such that an arrangement of the plurality of first crossovers is different from an arrangement of the plurality of apertures, and that the plurality of second crossovers are aligned with the plurality of apertures on the element.

The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.

Charged particle optical system, drawing apparatus, and method of manufacturing article

A drawing apparatus includes an aperture array, a lens array configured to form a plurality of crossovers of a plurality of charged particle beams from the aperture array, and a projection system including an element having a single aperture and configured to converge the plurality of charged particle beams corresponding to the plurality of crossovers and to project the plurality of charged particle beams having passed through the single aperture onto the substrate. The lens array includes a correction lens array including a converging lens eccentric relative to corresponding one of a plurality of apertures of the aperture array such that the plurality of charged particle beams converged according to aberration of the projection system are converged to the single aperture. The lens array includes a magnifying lens array configured, so as to form the plurality of crossovers, to magnify a plurality of crossovers formed by the correction lens array.

A drawing apparatus performs drawing on a substrate with charged particle beams. The drawing apparatus includes an irradiation optical system including a collimator lens; an aperture array configured to split the charged particle beam into a plurality of charged particle beams; a converging lens array configured to form a plurality of crossovers of the plurality of charged particle beams; and a projection optical system including an element in which a plurality of apertures corresponding to the plurality of crossovers are formed, and a plurality of projection lenses corresponding to the apertures. The converging lens array includes converging lenses disposed such that each of the plurality of crossovers, which are formed by the converging lenses from the charged particle beam incident on the aperture array at incidence angles associated with aberration of the irradiation optical system, is aligned with corresponding one of the apertures in the element.

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Utsunomiya, Japan

Kentaro Sano