Hitachi, Ltd.

The University of Tokyo

Kentaro Motohara

Toshihiko Nakata

Yukihiro Shibata

Atsushi Taniguchi

Hiroshi Toshiyoshi

Taketo Ueno

Takuya Takahashi

Shun'ichi Matsumoto

An optical filtering device and an optical inspection apparatus for detecting a defect in a high sensitivity using an optical filtering device which includes a shutter array formed in a two-dimensionally on an optically opaque thin film produced on a SOI wafer and the SOI wafer is removed at portions thereof on the lower side of the shutter patterns to form perforation portions while working electrodes are formed at the remaining portion of the SOI wafer, a glass substrate having electrode patterns formed on the surface thereof and having the shutter array mounted thereon, and a power supply section for supplying electric power to the electrode patterns formed on the glass substrate and the working electrodes of the SOI wafer. And the working electrodes is controlled to cause the shutter patterns to carry out opening and closing movements with respect to the perforation portions to carry out optical filtering.

Optical filtering device, defect inspection method and apparatus therefor

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Koganei, Japan

Kentaro Motohara