Nippon Steel Chemical Co., Ltd.

Kentaro Hayashi

Hironobu Kawasato

Kiwamu Tokuhisa

The present invention relates to a photosensitive resin composition excellent in pliability, ultraviolet sensitivity for development, developability with an aqueous alkali solution, and storage stability at room temperature and a circuit substrate employing the same. The photosensitive resin composition includes a siloxane-containing polyamic acid resin having structural units respectively represented by the following formulae (1), (2), and (3) and a photopolymerization initiator incorporated therein. The circuit substrate is coated with the photosensitive resin composition. In the formulae, Ar represents a residue of an aromatic tetracarboxylic acid; Rrepresents alkyl group having 1 to 6 carbon atoms or phenyl group; Rrepresents alkylene group having 2 to 6 carbon atoms or phenylene group; l represents a number of 0 to 10; Rrepresents a divalent group or a direct bond; Rrepresents &#x2014;CH&#x2550;CH&#x2014;R&#x2014;, in which Rrepresents a direct bond, alkylene group having 1 to 6 carbon atoms, or phenylene group; Rrepresents a diamine residue; and m, n, and o, indicating the range of the abundant molar ratios of the respective structural units, are 0.3 to 0.95, 0.05 to 0.7, and 0 to 0.5, respectively.

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Kisazaru, Japan

Kentaro Hayashi