Asahi Glass Company, Limited

Kenta Saitou

Akio Koike

Mitsuhiro Kawata

The present invention provides a TiO-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO-containing silica glass for optical member for EUV lithography, having a TiOconcentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T, of 70% or more.

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Tokyo, Japan

Kenta Saitou