Fujikin Inc.

Fujikin Incorporation

Kenta Kondo

Tomohiro Nakata

Tsutomu Shinohara

Hidenobu Sato

Toshihide Yoshida

Masahiko Takimoto

Kazunari Watanabe

Toshiyuki Inada

Takeru Miura

Nobuo Nakamura

Masahiko Nakazawa

Tomoko Yuhara

Kouji Nishino

Ryousuke Dohi

Kenji Aikawa

Ryutaro Tanno

Yuya Suzuki

Izuru Shikata

Daihi Tsuchiguchi

Tomoki Nakada

A diaphragm includes: a metal thin plate; and a thin film layer formed over an entirety of a surface on one side of the thin plate.

Diaphragm, valve device, and method for manufacturing diaphragm

A valve device includes: a body formed with a valve chamber, a first inflow passage, a second inflow passage, an outflow passage, and an annular groove and provided with a valve seat; and a diaphragm configured to communicate with and interrupt the second inflow passage and the outflow passage. An end portion of the second inflow passage is open to the valve chamber. The valve seat is provided on a peripheral edge of a location where the valve chamber and the second inflow passage communicate with each other. The annular groove is open to the valve chamber and is formed around the second inflow passage. An end portion of the outflow passage is open to the annular groove. The first inflow passage has a plurality of flow passages including an inflow port and a plurality of outflow ports, and each outflow port is open to the annular groove.

Valve device

A valve device capable of precisely adjusting a flow rate includes: an operating member for operating a diaphragm and provided movably between a closed position at which diaphragm closes a flow path and an open position at which diaphragm opens the flow path; a main actuator that receives pressure from a supplied drive fluid and moves the operating member to the open position or the closed position; an adjusting actuator for adjusting the position of the operating member positioned in the open position by using a passive element which expands and contracts in response to a given input signal; a position detecting mechanism for detecting the position of the operating member with respect to a valve body; and an origin position determining unit that uses a valve closed state in which the diaphragm contacts to valve seat to determine an origin position of the position detecting mechanism.

Valve device, flow rate control method, fluid control device, semiconductor manufacturing method, and semiconductor manufacturing apparatus using the valve device

A valve device is capable of precisely adjusting a flow rate variation with time, aging, or the like without using an external sensor or using as few external sensors as possible. The apparatus includes an adjusting actuator for adjusting the position of the operating member positioned at the open position, a communication unit for receiving adjustment information relating to the adjustment of the opening degree of the flow path by the valve element from the outside of the apparatus, and a control unit for adjusting the position of the operating member by driving the adjusting actuator based on the adjustment information.

Valve device, adjustment information generating method, flow rate adjusting method, fluid control system, flow rate control method, semiconductor manufacturing system and semiconductor manufacturing method

A valve device is capable of precisely adjusting a flow rate variation due to aging, aging, etc. without using an external sensor. An adjusting actuator includes a piezoelectric element for adjusting the position of the operating member positioned at the open position, and the drive circuit of the adjusting actuator includes a detecting unit for detecting an electric signal related to the amount of strain generated in the piezoelectric element, and a control unit for controlling the adjusting actuator so that the opening degree of the flow path by the valve element becomes the target opening degree based on the electric signal related to the amount of strain of the piezoelectric element.

Valve apparatus, flow rate adjusting method, fluid control apparatus, flow rate control method, semiconductor manufacturing apparatus, and semiconductor manufacturing method

A valve body unit is configured to be disengaged from a stem by moving the stem and the valve body unit to a valve seat side in a state where a bonnet is separated from the valve seat, thereby pushing a replacement ring such that the replacement ring moves through the bonnet while decreasing in diameter and then drops down onto a ring dropping portion in the free state, then moving the stem, the valve body unit, and the replacement ring to an opposite side to the valve seat side such that a first surface comes into contact with a second surface and the ring dropping portion comes into contact with the replacement ring, and in this state, moving only the stem to the opposite side to the valve seat side such that the connection formed by a connecting mechanism between the stem connection portion and the stem is released.

Valve device, method for replacing valve body unit of valve device, and valve device assembly method

A valve device includes: a valve device body including a valve seat; a diaphragm that is provided to cover a valve chamber; a stem; and a valve body portion that is inserted into a central portion of the diaphragm, and that is configured to open and close the fluid passage by approaching the valve seat and separating from the valve seat. The diaphragm includes a main diaphragm, and a support diaphragm positioned on an opposite side of the main diaphragm to the valve chamber side and provided in contact with the main diaphragm. A first terminal end portion on an inner peripheral side of the main diaphragm is fixed to the valve body portion. A second terminal end portion on an inner peripheral side of the support diaphragm is separated from the first terminal end portion on the inner peripheral side of the main diaphragm.

A valve device includes a valve body; a valve seat; an inner disk made of a metal alloy having an inner annular portion, outer annular portion and a connecting portion that connects the inner annular portion and the outer annular portion; a diaphragm made of a metal alloy covering the inner disk and the valve seat and moving between an open position at which the diaphragm does not contact the valve seat and a closed position at which the diaphragm contacts the valve seat to enable and shuts off communication between the first flow path and the second flow paths; and a presser adapter that presses a peripheral edge portion of the diaphragm toward the outer annular portion; and the inner disk has a hardness higher than the valve seat and lower than both the valve body and the diaphragm.

An actuator includes a casing having a first annular groove formed in an inner peripheral portion thereof; a piston having a second annular groove formed in an outer peripheral portion thereof, provided in the casing to form a pressure chamber together with the casing, and driven by a drive fluid from an outside of the actuator; and an annular seal member having a first fitting portion to be fitted into the first annular groove and a second fitting portion to be fitted into the second annular groove to seal the pressure chamber.

Actuator and valve device

Provided is a valve device which can precisely adjust the flow rate while ensuring the flow rate of the fluid. A valve device includes a main actuator which receives a pressure of a supplied drive fluid and moves an operating member to an open position or closed position; an adjusting actuator arranged to receive at least a part of a force generated by the main actuator and for adjusting the position of the operating member positioned at the open position; and a pressure regulator provided in a feed path of the drive fluid to the main actuator and for regulating the pressure of the supplied drive fluid to suppress fluctuation of the pressure of the drive fluid supplied to the main actuator.

A control device for a valve device can detect open/close state of the valve device without using limit switches. The valve device includes a diaphragm for opening and closing a flow path for flowing a fluid, a coil spring for biasing the diaphragm in the closing direction of flow path, a main actuator for driving it against the biasing force of the coil spring, and an adjusting actuator using a piezoelectric element for adjusting the opening degree of the flow path determined by the diaphragm. The controller detects the open/close state of flow path based on the voltage generated by the piezoelectric element of the adjusting actuator, and controls valve device using the detection signal.

Valve device, its control device, control methods using the same, fluid control device and semiconductor manufacturing apparatus

A gas supply system is provided with an automatic valve that is provided in a flow passage and adjusts a flow rate of process gas supplied to a chamber by automatic opening and closing, and a manual valve that is provided downstream of the automatic valve in the flow path and in immediate vicinity of the chamber and adjusts the flow rate of the process gas by manual opening and closing. The manual valve is a direct diaphragm valve having a diaphragm that is placed and separated on and from a seat in conjunction with a stem and a disk along with opening and closing, and includes a stroke adjusting mechanism that adjusts a valve stroke.

Gas supply system

An actuator includes: a casing; a pressure reducing valve and a piston. The pressure reducing valve is provided in the casing to reduce a pressure of a driving fluid supplied from an outside of the casing to a predetermined level. The piston is provided in the casing to form a pressure chamber together with the casing. The piston is driven by the driving fluid that has been pressure-reduced to the predetermined level.

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Osaka, Japan

Kenta Kondo