Tokyo Ohka Kogyo Co., Ltd.

Fuji Electric Co., Ltd.

Kensuke Matsuzawa

Hiroaki Shimizu

Yoshiyuki Utsumi

Akiya Kawaue

Hideo Hada

Keita Ishiduka

Tsuyoshi Nakamura

Takehiro Seshimo

Jun Iwashita

Kyoko Ohshita

Takeshi Iwai

Hiromichi Gohara

Fumitake Kaneko

Takahiro Koyama

Yasuhiro Yoshii

Naoto Motoike

Masatoshi Arai

Takahiro Dazai

Yoshitaka Komuro

Yuichi Suzuki

Masaru Takeshita

Kotaro Endo

Tsuyoshi Kurosawa

Shinichi Hidesaka

Kenri Konno

Komei Hirahara

Natsuko Maruyama

Yoshiyuki Utsume

A cooler includes a top plate, one surface of which serves as a heat dissipation surface, a bottom plate disposed so as to face the top plate and having a larger thickness than that of the top plate, a plurality of fins provided between the top plate and the bottom plate, and a circumferential wall part provided so as to surround the plurality of fins along outer circumferential edges of the bottom plate. The plurality of fins and the outer circumferential wall part are provided between the top plate and the bottom plate and bonded to the heat dissipation surface of the top plate. A flow path for a coolant is formed by a space enclosed by the top plate, the bottom plate, the plurality of fins, and the circumferential wall part. The top plate has an electric potential higher than that of the bottom plate.

Cooler and semiconductor apparatus

Provided is a semiconductor module including semiconductor devices and a cooling apparatus, wherein the semiconductor device has semiconductor chips and a circuit board with the semiconductor chips implemented thereon; the cooling apparatus has a top plate, a side wall, a bottom plate, a coolant flow portion, an inlet, an outlet and a plurality of fins; the top plate and the bottom plate have three through holes that are through holes for inserting fastening members that fasten the semiconductor module to an external apparatus, penetrating the top plate and the bottom plate in one direction respectively; and a geometric center of gravity of a aperture of at least one of the inlet and the outlet may also be positioned inside a virtual triangle with the three through holes being vertexes in planar view.

Semiconductor module and vehicle

Resist composition and method of forming resist pattern

A resist composition including a resin component which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resin component including a resin component having a structural unit represented by a general formula (a0-0-1) shown below  in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, Rrepresents a single bond or a divalent linking group, each of R, Rand Rindependently represents a linear, branched or cyclic alkyl group which may have a non-aromatic substituent, or Rand Rmay be bonded to each other to form a ring together with the sulfur atom, and X represents a non-aromatic divalent linking group or a single bond.

Resist composition, method of forming resist pattern and polymeric compound

A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which Rrepresents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Qand Qindependently represents a single bond or a divalent linkage group; Yrepresents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Zrepresents an organic cation exclusive of an ion represented by general formula (w-1).

Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein Rrepresents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Qand Qindependently represents a single bond or a divalent linkage group; Yrepresents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Zrepresents an organic cation exclusive of an ion represented by general formula (w-1).

A resist composition including a base component which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and an organic solvent component, the base component containing a resin component having a structural unit which generates acid, and the organic solvent component containing an organic solvent component including a compound represented by general formula (s-1) shown below in which X represents a single bond or an alkylene group of 1 to 3 carbon atoms; and n represents an integer of 0 to 3. 

A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) shown below, a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a structural unit (a6) which generates acid upon exposure (wherein Rrepresents a hydrogen atom, an alkyl group or a halogenated alkyl group; W represents &#x2014;COO&#x2014;, &#x2014;CONH&#x2014; or a divalent aromatic hydrocarbon group; Yand Yrepresents a divalent linking group or a single bond; R'represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R&#x2032;represents a monovalent aliphatic hydrocarbon group; and Rrepresents an &#x2014;SO&#x2014; containing cyclic group). 

A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: 

Resist composition, method of forming resist pattern, compound and acid generator

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety comprising a group represented by general formula (I) (in the formula, Rrepresents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group). 

Resist composition, method of forming resist pattern, novel compound, and acid generator

A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b1-2) shown below:

Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern

A resist composition including a base component that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator consisting of a compound represented by general formula (b1). In formula (b1), Yrepresents a fluorinated alkylene group of 1 to 4 carbon atoms, X represents an aliphatic cyclic group of 3 to 30 carbon atoms, R' to R&#x2032; each represents an aryl group or alkyl group, provided that at least one of R&#x2032; to R&#x2032; is an aryl group having a substituent represented by general formula (b1-0), and two alkyl groups among R&#x2032; to R&#x2032; may be bonded to each other to form a ring with the sulfur atom in the formula. In formula (b1-0), Rrepresents a chain-like or cyclic hydrocarbon group, and f and g each represents 0 or 1. 

Resist composition, method of forming resist pattern, and novel compound and acid generator

A positive resist composition including a resin component (A) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, a C-Calkyl group or a C-Chalogenated alkyl group; Rrepresents a Cor more branched alkyl group; and each of Rand Rindependently represents an alkyl group, wherein Rand Rmay be mutually bonded to form a polycyclic group) and/or general formula (a0-2) (R is the same as defined above; Rrepresents a divalent linking group that contains no halogen atom; and Rrepresents an acid dissociable, dissolution inhibiting group), and an acid generator (B1) consisting of a compound represented by general formula (b1) (Yrepresents a C-Cfluorinated alkylene group which may have a substituent; X represents a C-Caliphatic cyclic group which may have a substituent; and Arepresents an organic cation). 

Positive resist composition and method of forming resist pattern

A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;O&#x2014;R&#x2014; or &#x2014;S&#x2014;R&#x2014;, wherein each of Rand Rindependently represents an alkylene group of 1 to 5 carbon atoms; Rrepresents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Qrepresents an alkylene group of 1 to 12 carbon atoms or a single bond; Yrepresents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; Mrepresents an alkali metal ion; and Arepresents an organic cation.

Growing community of inventors

Kawasaki, Japan

Kensuke Matsuzawa