Sumitomo Chemical Company, Limited

Kensuke Maekawa

Kazuyuki Ito

Masakazu Sumida

Shota Konishi

Noboru Kondo

The present invention relates to a poly(biphenyl ether sulfone) resin substantially comprising a repeating structure of the following formula (1), and having a spin-lattice relaxation time Tof a long component of 24 s or more, which is calculated from decay of a signal intensity I (τ) corresponding to a chemical shift of 129 ppm by acquiring aC-NMR spectrum by a Torchia pulse sequence using an NMR device for solid sample measurement and changing a value of a waiting time τ in the pulse sequence,

Poly(biphenyl ether sulfone) resin, production method therefor, and melt-molded article

Provided are an acrylic resin layer laminate having excellent impact resistance and a manufacturing method of the same. The laminate includes a first acrylic resin layer, a thermoplastic resin layer, and a second acrylic resin layer in this order, in which the thermoplastic resin layer contains 71% or more of a component having a spin-spin relaxation time Tin pulse NMR measurement of 0.03 ms or longer. The manufacturing method of the laminate includes: discharging, from a die, a molten resin laminate containing at least a melt of a resin composition (1) containing a (meth)acrylic resin, a melt of a resin composition containing a thermoplastic resin, and a melt of a resin composition (2) containing a (meth)acrylic resin; and cooling the discharged molten resin laminate to obtain a laminate.

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Osaka, Japan

Kensuke Maekawa