Momentive Performance Materials Gmbh

Kensuke Fujimura

Yuji Morikawa

Yoshihiko Matsui

Akinobu Otaka

Takeshi Higuchi

John T Mariner

Zhong-Hao Lu

A resistance heater is shown and described. The resistance heater may include a body. The body may include at least one heating surface, the heating surface being generally smooth and generally flat and a recess formed in the body, at least a portion of the body having a cross-sectional shape selected from the group consisting of: generally U shape, generally I-shape, and generally H-shape, and where the cross-sectional shape extends along at least a portion of the body.

Resistance heater

A heater has a smooth heating surface and a recess formed on a second surface opposite to the heating surface. The recess is formed between opposite side walls in a lengthwise direction of the heater. Formation of the recess improves the electrical resistance of the heater and the opposite side walls reinforce the heater and prevent deformation of the heater when it is subjected to high temperatures in a semiconductor wafer processing device. The heater has substantially the same width along its lengthwise direction. This improves the control of heat pattern design, because the terminal end portions do not have an expanded shape.

A vacuum heater assembly for heating fluids flowing within; the assembly comprises an inner member having a heating surface with an average cross-sectional area with an aspect ratio of at least 2. The inner member is disposed within an outer member and with a vacuum drawn in the space between the inner member and the outer member, the heat transfers toward the center of the inner member, heating the fluids flowing within.

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Nasu-machi, Japan

Kensuke Fujimura