B/e Aerospace, Inc.

Advanced Thermal Sciences Corporation

Other

Applied Materials, Inc.

Acurex Corporation

Cowans, Kenneth W.

Kenneth Wesley Cowans

Glenn Zubillaga

William W Cowans

Isaac Millan

Daniel John Hoffman

Douglas A Buchberger, Jr

Kallol Bera

Paul Brillhart

Richard Charles Fovell

Douglas H Burns

Hamid Tavassoli

Matthew Antoniou

Williams W Cowans

Isaac Millian

Glenn W Zubillaga

Versatile temperature control systems adaptable to many different applications employ different states and proportions of a pressurized dual phase medium in direct contact with a thermal load. In one aspect of the invention, thermal energy generated by pressurization of a gaseous medium is stored at a selected temperature level so that it is later readily accessible. In addition, in accordance with the invention temperature control of a two-phase medium can be exercised across selectable dynamic ranges and with different resolutions. In accordance with such features, the control can be exerted by varying the input flow rate of a mixture applied to a thermal load, or by controlling the back pressure of the flow through the thermal load. In accordance with another feature of the invention, substantial energy conservation can be effected by employing an ambient temperature evaporator configuration between the thermal load and the input to the compressor. This variant also utilizes the two-phase characteristics of the medium. Moreover, the system can be configured compactly utilizing a thermal reservoir for retaining thermal energy for special purposes. In a food processing system for providing a frozen product, for example, the thermal reservoir can be accessed to utilize the refrigerant itself in different operating modes, such as rapid heating and system cleansing. In the food processing application, target temperatures can be set and maintained on a platen which is to receive food ingredients using energy flows at two different enthalpies, to enable rapid freezing or temperature elevation.

Temperature control system and method TDSF plus

In a temperature control system using a controlled mix of high temperature pressurized gas and a cooled vapor/liquid flow of the same medium to cool a thermal load to a target temperature in a high energy environment, particular advantages are obtained in precision and efficiency by passing at least a substantial percentage of the cooled vapor/liquid flow through the thermal load directly, and thereafter mixing the output with a portion of the pressurized gas flow. This 'post load mixing' approach increases the thermal transfer coefficient, improves control and facilities target temperature change. Ad added mixing between the cooled expanded flow and a lesser flow of pressurized gas also is used prior to the input to the thermal load. A further feature, termed a remote 'Line Box', enables transport of the separate flows of the two phase medium through a substantial spacing from pressurizing and condensing units without undesired liquefaction in the transport lines.

Method and apparatus for thermal exchange with two-phase media

A temperature control system is disclosed where thermal energy generated by pressurization of a gaseous medium is stored at a selected temperature level so that it is later readily accessible. Temperature control of a two-phase medium is exercised across selectable dynamic ranges and with different resolutions and the control can be exerted by varying the input flow rate of a mixture applied to a thermal load, or by controlling the back pressure of the flow through the thermal load.

A temperature control system employing a two-phase refrigerant and a compressor/condenser loop is disclosed wherein a two phase refrigerant condenses within the load, the system including a thermo-expansion valve that simultaneously allows refrigerant flow through the thermo-expansion valve and regulates a temperature of the refrigerant in its two phase state ahead of the thermo-expansion valve, and wherein a flow through the thermo-expansion valve occurs only after a pressure and temperature upstream of the thermo-expansion valve reaches a final temperature and pressure.

Temperature control system with programmable ORIT valve

One of the two combustion chambers of an internal combustion engine using variable compression ratio and fuel charge, VCRC engine, is improved. These improvements involve adding another, second combustion chamber for mixing products of the first combustion with engine air and refining the insulation of engine heat in the engine process.

VCRC engine with insulated chambers

The air supply to internal combustion engines using variable compression ratio and variable fuel supply VCRC, is improved. The improvements involve increasing thermal efficiency and/or reducing production of pollutants by this engine. The improvements can also be used with other engines that are regulated by fuel supply such as two-stroke diesel engines. These improvements are directed to engines in two basic categories; those with mechanical blowers only and those with turbo charging.

Air supply concepts to improve efficiency of VCRC engines

A plasma reactor having a reactor chamber and an electrostatic chuck having a surface for holding a workpiece inside the chamber includes inner and outer zone backside gas pressure sources coupled to the electrostatic chuck for applying a thermally conductive gas under respective pressures to respective inner and outer zones of a workpiece-surface interface formed whenever a workpiece is held on the surface, and inner and outer evaporators inside respective inner and outer zones of the electrostatic chuck and a refrigeration loop having respective inner and cuter expansion valves for controlling flow of coolant through the inner and outer evaporators respectively. The reactor further includes inner and outer zone temperature sensors in inner and outer zones of the electrostatic chuck and a thermal model capable of simulating heat transfer through the inner and outer zones, respectively, between the evaporator and the surface based upon measurements from the inner and outer temperature sensors, respectively. Inner and outer zone agile control processors coupled to the thermal model govern the inner and outer zone backside gas pressure sources, respectively, in response to predictions from the model of changes in the respective pressures that would bring the temperatures measured by the inner and outer zone sensors, respectively, closer to a desired temperature.

Plasma reactor with a multiple zone thermal control feed forward control apparatus

A method of transferring heat from or to a workpiece support in an RF coupled plasma reactor includes placing coolant in an internal flow channel that is located inside the workpiece support and transferring heat from or to the coolant by circulating the coolant through a refrigeration loop in which the internal flow channel of the workpiece support constitutes an evaporator of the refrigeration loop. The method further includes maintaining thermal conditions of the coolant inside the evaporator within a range in which heat exchange between the workpiece support and the coolant is primarily or exclusively through the latent heat of vaporization of the coolant.

Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor

A system for improving the thermal efficiency of a thermal control loop in which refrigerant after compression and condensation is applied to an evaporator employs a subsidiary counter-current heat exchange intercepting refrigerant flow to maintain the quality of the refrigerant by exchanging thermal energy between the input flow and the output flow from the evaporator. The same principle is effective, with particular advantage when small connections have to be made, in systems using mixed phase media and using the concept of direct energy transfer with saturated fluid.

Thermal control system and method

A method of controlling wafer temperature in a plasma reactor by obtaining the next scheduled change in RF heat load on the workpiece, and using thermal modeling to estimate respective changes in wafer backside gas pressure and in coolant flow through a wafer support pedestal that would compensate for the next scheduled change in RF heat load, and making the respective changes in the backside gas pressure or in the coolant flow prior to the time of the next scheduled change.

Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control

A system and method for controlling cooling of a thermal load having different cooling requirements in different sections based on direct thermal exchange using a two-phase refrigerant employs the pressure/temperature characteristics of the refrigerant to particular benefit for this multi-level cooling system. The two-phase refrigerant is first adjusted to have temperature/enthalpy characteristics chosen as the starting level for different cooling demands at related temperatures. After appropriate generation of a mixture of two-phase refrigerant initial reference temperature and pressure are established. Thereafter, incremental changes in the comprising hot gas and expanded cooled liquid/vapor, an temperature cooling medium area made by lowering the pressure by predetermined amounts, or alternatively by bypassing the pressure drop and proceeding to the next stage.

System and method for thermal control of different heat loads from a single source of saturated fluids

A plasma reactor for processing a workpiece includes a reactor chamber, an electrostatic chuck within the chamber having a top surface for supporting a workpiece and having indentations in the top surface that form enclosed gas flow channels whenever covered by a workpiece resting on the top surface. The reactor further includes thermal control apparatus thermally coupled to the electrostatic chuck, an RF plasma bias power generator coupled to apply RF power to the electrostatic chuck, a pressurized gas supply of a thermally conductive gas, a controllable gas valve coupling the pressurized gas supply to the indentations to facilitate filling the channels with the thermally conductive gas for heat transfer between a backside of a workpiece and the electrostatic chuck at a heat transfer rate that is a function of the pressure against the backside of the workpiece of the thermally conductive gas. The reactor further includes an agile workpiece temperature control loop including (a) a temperature probe in the electrostatic chuck, and (b) a backside gas pressure controller coupled to an output of the temperature probe and responsive to a specified desired temperature, the controller governing the gas valve in response to a difference between the output of the temperature probe and the desired temperature.

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Fullerton, CA, United States of America

Kenneth Wesley Cowans