Orthogonal, Inc.

Kenneth Nicholas Boblak

Douglas Robert Robello

Terrence Robert O'Toole

Diane Carol Freeman

Meng Zhao

Charles Warren Wright

Frank Xavier Byrne

Sandra Rubsam

A method of patterning a device includes forming a fluorinated photopolymer layer over a device substrate. The photopolymer layer has a lower portion proximate the device substrate and an upper portion distal the device substrate. The fluorinated photopolymer layer includes a radiation-absorbing dye and a fluorinated photopolymer having a solubility-altering reactive group. The photopolymer layer is exposed to patterned radiation to form exposed and unexposed areas in accordance with the patterned radiation and a developed structure is formed by removing unexposed areas using a developing agent that includes a first fluorinated solvent. The lower portion of the exposed area of the photopolymer layer has a dissolution rate in the developing agent that is at least 5 times higher than a dissolution rate for the upper portion.

Photolithographic patterning of electronic devices

Growing community of inventors

Oakland, CA, United States of America

Kenneth Nicholas Boblak