Control Data Corporation

Photoelectron Corporation

Uvtech Systems, Inc.

Other

Carl Zeiss Ag

Hughes Danbury Optical Systems, Inc.

Kenneth J Harte

Alan P Sliski

Donald O Smith

David J Elliott

Ronald P Millman, Jr

Victoria M Chaplick

Guenther O Langner

Murray L Tardif

Marvin Fishbein

Eugene O Degenkolb

Mark T Dinsmore

Robert A Roth

Joseph L Mclaughlin

David M Walker

Mark R Fernald

Edward C Dougherty

John J Carrona

David C Bono

Larry E Shephard

Michael J Dalterio

John Valun

Vijay K Singhal

John F Beatty

James J Gordon

Peter J Biggs

Peter E Oettinger

Hollister B Sykes

A method and apparatus for processing substrate edges is disclosed that overcomes the limitations of conventional edge processing methods and systems used in semiconductor manufacturing. The edge processing method and apparatus of this invention includes a laser and optical system to direct a beam of radiation onto a rotating substrate supported by a chuck, in atmosphere. The optical system accurately and precisely directs the beam to remove or transform organic or inorganic films, film stacks, residues, or particles from the top edge, top bevel, apex, bottom bevel, and bottom edge of the substrate. An optional gas injector system directs gas onto the substrate edge to aid in the reaction. Process by-products are removed via an exhaust tube enveloping the reaction site. This invention permits precise control of an edge exclusion zone, resulting in an increase in the number of usable die on a wafer. Wafer edge processing with this invention replaces existing solvent and/or abrasive methods and thus will improve die yield.

Method and apparatus for processing substrate edges

A method and apparatus for processing substrate edges is disclosed that overcomes the limitations of conventional edge processing methods and systems used in semiconductor manufacturing. The edge processing method and apparatus of this invention includes a laser and fiber-optic system to direct laser radiation onto a rotating substrate supported by a chuck. A laser beam is transmitted into a bundle of optical fibers, and the fibers accurately and precisely direct the beam to remove or transform organic or inorganic films, film stacks, residues, or particles, in atmosphere, from the top edge, top bevel, apex, bottom bevel, and bottom edge of the substrate in a single process step. Reaction by-products are removed by means of an exhaust tube enveloping the reaction site. This invention permits precise control of an edge exclusion width, resulting in an increase in the number of usable die on a wafer. Wafer edge processing with this invention replaces existing methods that use large volumes of purified water and hazardous chemicals including solvents, acids, alkalis, and proprietary strippers.

Fiber-optic beam delivery system for wafer edge processing

A method and apparatus for processing substrate edges is disclosed that overcomes the limitations of conventional edge processing methods and systems used in semiconductor manufacturing. The edge processing method and apparatus of this invention includes a laser and optical system to direct a beam of radiation onto a rotating substrate supported by a chuck. The optical system accurately and precisely directs the beam to remove or transform organic or inorganic films, film stacks, residues, or particles, in atmosphere, from the top edge, top bevel, apex, bottom bevel, and bottom edge of the substrate in a single process step. An optional gas injector system directs gas onto the substrate edge to aid in the reaction. Reaction by-products are removed by means of an exhaust tube enveloping the reaction site. This invention permits precise control of an edge exclusion width, resulting in an increase in the number of usable die on a wafer. Wafer edge processing with this invention replaces existing methods that use large volumes of purified water and hazardous chemicals including solvents, acids, alkalis, and proprietary strippers.

A method and apparatus for processing substrate edges is disclosed that overcomes the limitations of conventional edge processing methods and systems used in semiconductor manufacturing. The edge processing method and apparatus of this invention includes a laser and optical system to direct a beam of radiation onto a rotating substrate supported by a chuck, in atmosphere. The optical system accurately and precisely directs the beam to remove or transform organic or inorganic films, film stacks, residues, or particles from the top edge, top bevel, apex, bottom bevel, and bottom edge of the substrate in a single process step. Reaction by-products are removed by means of an exhaust tube enveloping the reaction site. This invention permits precise control of an edge exclusion width, resulting in an increase in the number of usable die on a wafer. Wafer edge processing with this invention replaces existing methods that use large volumes of purified water and hazardous chemicals including solvents, acids, alkalis, and proprietary strippers.

Orthogonal beam delivery system for wafer edge processing

A scanning plasma reactor for exciting reactant gases at a substrate surface including a beam forming module, a gas injection module, a reaction chamber with a window and a vacuum chuck, a gas exhaust module. Radiation from the beam forming module and the reactant gas create an excited plasma zone. The excited plasma zone is translated across the substrate like a windshield wiper blade, or the substrate is conveyed under a fixed gas reaction zone.

Scanning plasma reactor

A radiation applicator system is structured to be mounted to a radiation source for providing a predefined dose of radiation for treating a localized area or volume, such as the tissue surrounding the site of an excised tumor. The applicator system includes an applicator and an adapter. The adapter is formed for fixedly securing the applicator to a radiation source, such as a radiosurgery system which produces a predefined radiation dose profile with respect to a predefined location along the radiation producing probe. The applicator includes a shank and an applicator head, wherein the head is located at a distal end of the applicator shank. A proximate end of the applicator shank couples to the adapter. A distal end of the shank includes the applicator head, which is adapted for engaging and/or supporting the area or volume to be treated with a predefined does of radiation. The applicator can include a low energy radiation filter inside of the applicator head to reduce undesirable low energy radiation emissions. A biocompatible radiation shield may be coupled to the outer surface of the applicator head to block radiation emitted from a portion of the radiation probe, in order to shield an adjacent location or vital organ from any undesired radiation exposure. A plurality of applicators having applicator heads and radiation shields of different sizes and shapes can be provided to accommodate treatment sites of various sizes and shapes.

Shaped biocompatible radiation shield and method for making same

A radiation applicator system is structured to be mounted to a radiation source for producing a predefined dose of radiation for treating a localized volume of tissue, such as the tissue surrounding the site of an excised tumor. The applicator system includes an applicator and, in some embodiments, an adapter. The adapter is formed for fixedly securing the applicator to a radiation source, such as the x-ray source of a radiosurgery system which produces a predefined radiation dose profile with respect to a predefined location along its radiation producing probe. The applicator includes a shank and an applicator head, wherein the head is located at a distal end of the applicator shank. A proximate end of the applicator shank couples to the adapter. A distal end of the shank includes the applicator head, which defines a concave treatment surface for engaging and, preferably, supporting the area to be treated with a predefined does of radiation. The applicator can include a low energy radiation filter inside of the applicator head to reduce undesirable low energy radiation emissions. A plurality of applicators having applicator heads of different sizes and shapes can be provided to accommodate treatment sites of various sizes and shapes. And, an adaptable applicator having a plurality of radiation positions can be provided to deliver a substantially cylindrical dose of radiation.

Apparatus for local radiation therapy

A support system for a radiation treatment system includes a rotatable extension arm extending from a vertical shaft and a rotatable counterbalance extending diametrically opposed to the extension arm from the vertical shaft. The vertical shaft is rotatably supported by a support base. The support base may include a damping mechanism to damp the rotational motion of the vertical shaft relative to the support base, wherein the damping force is preferably proportional to the velocity of the vertical shaft. The radiation treatment system is suspended from a cable extending from a distal end of the extension arm. The extension arm can be formed from a first arm extending from the vertical shaft and a second arm rotatably coupled to the first arm in order to permit the radiation treatment system to be moved in horizontal direction. The cable supporting the radiation treatment system can be coupled to a vertical counterbalance weight to allow the vertical position of the radiation treatment system to be adjusted. In addition, mass of the vertical counterbalance weight can be adjusted to compensate for attachments which may be used with the radiation treatment system during treatment. The radiation treatment system can be supported to permit rotation about a horizontal axis that extends through the center of mass of the radiation treatment system. In addition position of the horizontal axis of rotation relative to the center of mass of the radiation treatment system can be adjusted to compensate for attachments which may change the center of mass of the radiation treatment system.

Support system for a radiation treatment apparatus

A radiation applicator system is structured to be mounted to a radiation source for producing a beam of radiation for treating a localized volume of tissue, such as growing blood vessels in the eye that can cause macular degeneration. The applicator system includes an applicator and, in some embodiments, an adapter. The adapter is formed for fixedly securing the applicator to a radiation source, such as a radiosurgery system which produces a predefined radiation dose profile with respect to a predefined location along the radiation producing probe. The applicator includes a shank and an applicator head. A proximate end of the applicator shank couples to the adapter. A distal end of the shank includes the applicator head, which is adapted to produce a beam of radiation. The applicator head includes a radiation shield and a beam collimator. The radiation shield selectively blocks the emitted radiation so that the applicator can be held by a surgeon during treatment. The beam collimator extends from an aperture in the shield that forms and directs a beam of radiation at a target area. Applicator systems that form different size and shape beams of radiation can be provided to accommodate a wide range of treatment volumes and for use in different treatments.

A radiation applicator system is structured to be mounted to a radiation source for providing a predefined dose of radiation for treating a localized volume of tissue, such as the tissue surrounding the site of an excised tumor. The applicator system includes an applicator and, in some embodiments, an adapter. The adapter is formed for fixedly securing the applicator to a radiation source, such as a radiosurgery system which produces a predefined radiation dose profile with respect to a predefined location along its radiation producing probe. The applicator includes a shank and an end cap, wherein the end cap includes a substantially flat or convex treatment surface and is located at a distal end of the applicator shank. A proximate end of the applicator shank couples to the adapter. A distal end of the shank includes the end cap, which is adapted for engaging and preferably supporting the area to be treated with a predefined does of radiation. The applicator can include a low energy radiation filter inside of the applicator end cap to reduce undesirable low energy radiation emissions. A plurality of applicators having end caps of different sizes and shapes can be provided to accommodate treatment sites of various sizes and shapes. And, an adaptable applicator having a plurality of radiation positions can be provided to deliver a substantially cylindrical dose of radiation.

The present invention is directed to an x-ray source for irradiating a surface defining a body cavity in accordance with a predetermined dose distribution. The source comprises a housing, an elongated tubular probe, a target assembly, and an inflatable balloon. The housing encloses an electron beam source and includes elements for generating an electron beam along a beam path. The tubular probe extends along a central axis from the housing about the beam path. The target assembly extends along the central axis and is coupled to the end of the probe distal from the housing. The target assembly includes a target element is positioned in the beam path. The target element is adapted to emit x-rays in response to electrons incident thereon from the beam. The probe tip assembly and associated control electronics include elements for positioning the target element in the beam path, and is substantially x-ray transparent. The balloon is affixed to the distal end of the probe and is inflatable so that when that probe end is inserted into a body cavity, the balloon may be inflated to stretch the cavity to a known shape. Positioning the probe tip inside the inflated balloon allows delivery of a uniform, or other desired, dose of radiation to the surface defining a body cavity.

X-ray apparatus for applying a predetermined flux to an interior surface

The present invention is directed to a kit for delivering x-rays to the interior surface of a body cavity. The kit includes an x-ray source and an x-ray source guidance tube. The guidance tube includes an inflatable inelastic balloon disposed about and affixed at its distal end such that when inflated, the central axis of the balloon is coaxial with and is disposed about the central axis of the tubular element. Inflation and deflation of the balloon is controllable from the proximal end of the tubular element. The x-ray source may include an electron activated target for generating x-rays in response to electrons incident on the target. The x-ray source may also includes means for generating an electron beam and steering the beam so that it is incident on the target. The target end is slidably positionable within an interior channel of the source guidance tube.

Apparatus for applying a predetermined x-radiation flux to an interior

An optical beam homogenizer includes an entrance pupil through which a non-uniform optical beam propagates. A first optical component having plural flat surfaces receives the input beam. The flat surfaces of the first optical component effectively segment the entrance pupil by dividing the input beam into plural beamlets, one beamlet for each pupil segment and flat surface. The beamlets are received by a second optical component which also has multiple flat surfaces, each flat surface receiving a beamlet. The second optical component directs the beamlets toward each other such that they overlap at an exit pupil of the system. The second optical component also focuses the beamlets such that an image of each entrance pupil segment is formed at the exit pupil. The images of the individual entrance pupil segments are superimposed upon each other at the exit pupil to form a uniform optical output beam.

Optical beam homogenizing apparatus and method

A method of treating brain tumors in a patient, comprising the steps of: identifying and locating a brain tumor in vivo by affixing a stereotactic frame to the head of the patient, performing a computer tomographic (CT) scan of the skull of the patient to determine the location, size, and shape of the tumor with respect to the stereotactic frame, performing a biopsy by inserting an extraction tool along a path measured with respect to the frame to the tumor location, extracting a tissue from the location, removing the needle and the extracted tissue and analyzing the tissue; implanting at least a portion of an adjustable x-ray radiation source in the patient proximate the tumor, the adjustable radiation source including an electron beam source outside the head of the patient, and directing an electron beam produced by the source outside the head of the patient along the path to the location; and controlling the source to generate an x-ray radiation pattern characterized by a spatial and temporal distribution, to selectively irradiate the tumor.

Method for treating brain tumors

This invention is directed to an x-ray source comprising a power supply, a flexible fiber optic cable assembly, a light source, and a target assembly. The power supply includes a first terminal and a second terminal, and elements for establishing an output voltage between the first terminal and the second terminal. The flexible fiber optical cable assembly has an originating end and a terminating end, and includes a fiber optical element extending from the originating end to the terminating end. The cable is adapted for transmitting light incident on the originating end to the terminating end. The light source includes elements for generating a beam of light at and directed to the originating end of the fiber optical cable assembly. The target assembly is affixed to the terminating end of the fiber optical cable assembly and is electrically coupled to the power supply by way of the first terminal and the second terminal. The target assembly includes elements for emitting x-rays in a predetermined spectral range, in response to light transmitted to the terminating end.

Growing community of inventors

Carlisle, MA, United States of America

Kenneth J Harte