Micron Technology Incorporated

Kenneth H Somerville

Richard D Holscher

Linda K Somerville

The detectability of photoresist is enhanced through the addition of materials to enhance the fluorescence of photoresist such that residual photoresist that either does not fluoresce or fluoresces at an emission wavelength shorter that that which can be detected using existing automatic resist inspection tools. In one embodiment of the invention, a benign tag that does not interfere with the photochemistry of the photoresist is added to the photoresist before it is processed. In a second embodiment of the invention, a tag is introduced onto a surface on which residual photoresist may be present such that the tag is absorbed or adsorbed by the residual photoresist, thereby rendering the residual photoresist easily detectable. The tag may be introduced onto the surface in a solution.

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Boise, ID, United States of America

Kenneth H Somerville