University of Colorado

Boston University

Other

Kenneth Douglas

Thomas Andrew Winningham

Kenneth J Rothschild

Garret R Moddel

Jacques I Pankove

Noel A Clark

Harry P Gillis

A method of manufacturing an array of nanoclusters and a substrate with an ordered array of nanoclusters. In a preferred embodiment of the invention, nanoclusters may be fabricated by depositing adatoms upon a surface containing an array of etched nanoscale wells, wherein the etched nanoscale wells are produced by etching a surface patterned by a mask containing a regular array of nanoscale pores. More preferably, nanoclusters may be fabricated by depositing adatoms upon a surface containing an array of etched nanoscale wells; wherein, the etched nanoscale wells are produced by low damage etching of a surface patterned by a crystalline mask of biological origin containing a regular array of nanoscale pores. A still further embodiment of the invention is a substrate including an ordered array of nanoclusters.

Ordered arrays of nanoclusters

A method of manufacturing an array of nanostuctures, such as quantum dots, having a controlled diameter and a substrate with an ordered array of nanostructures having a controlled diameter. In a preferred embodiment of the invention, nanoscale features are produced on a substrate by using a porous crystalline protein as a template for preparing an etch/deposition mask having a regular array of nanoscale pores of a diameter different from the protein template. The mask may be used to etch a regular array of nanoscale wells and/or deposit nanoclusters of adatoms on the surface of an underlying substrate. A further embodiment of the invention is a substrate including an ordered array of nanoscale features having a controlled size.

Tunable nanomasks for pattern transfer and nanocluster array formation

A method for using intermediate transfer layers for transferring nanoscale patterns to substrates and forming nanostructures on substrates. An intermediate transfer layer is applied to a substrate surface, and one or more mask templates are then applied to the intermediate transfer layer. Holes are etched through the intermediate transfer layer, and material may be deposited into the etched holes.

Intermediate transfer layers for nanoscale pattern transfer and nanostructure formation

Dynamic variation in the color produced by a silicon quantum dot laser is achieved by utilizing segmented sections or patches of quantum dots of differing sizes to produce different colors of light. The amount of each color of light produced is controlled by selectively biasing the segments of quantum dots. The light is caused to resonate coherently and is emitted out by a diffraction grating. The dynamic variation in the color of light produced by such a device makes it useful as a multicolor pixel in a color display of images.

Silicon quantum dot laser

Articles exhibiting fabricated structures with nanometer size scale features (nanostructures), typically a device comprising nanostructures of a functional material on or in a substrate of dissimilar material, are produced by a method employing a substrate base or coating and a thin layer serving as a lithographic mask or template, consisting of a self-assembled ordered material array, typically a periodic array of molecules such as undenatured proteins, exhibiting holes, thickness or density variations. It is possible to produce complex structures containing large numbers of nanometers scale elements through a small number of simple steps.

Growing community of inventors

Boulder, CO, United States of America

Kenneth Douglas