Aixtron Se

Aixinno Limited

Kenneth B K Teo

Maxim Kelman

Brian Lu

Nalin L Rupesinghe

Alexandre Jouvray

David Anthony Bullinaria

Patrick Clemente Gilligan

Scott William Dunham

Shahab Khandan

Goncalo Pedro Goncalves

Simon Thomas

Ian Blackburn

David Eric Rippington

Tac Van Huynh

Bernd Schineller

Jai Matharu

Patrick Clement Gilligan

John Edward Connah

Nalin Lalith Rupesinghe

A module for an automated biology laboratory system includes a housing and a storage device located within the housing. The storage device has a plurality of plate slots for receiving microplates or lab-ware with a microplate footprint or containers. The laboratory system further includes a transfer slot to transfer the microplates or containers between an inside of the module and an outside of the module; indexing means to facilitate alignment of the transfer slot with a microplate transfer interface comprising an aperture of the housing; and connection means for fixedly connecting the transfer interface of the module to a transfer interface of an adjacent module.

Module for an automated biology laboratory system with an interface to transfer microplates or lab-ware

A process module for a biology laboratory system includes a housing, a working deck located within the housing, having working deck plate slots for receiving cell culture plates, a liquid handling robot comprising at least one pipette for aspirating a liquid medium, and a first transfer interface in communication with a first storage module for storing cell culture plates. The working deck is movable to a plurality of working positions. In one of the positions, the cell culture plate is located under an operating point of the liquid handling robot. In another of the positions, the cell culture plate is in alignment with the first transfer interface for transfer of the cell culture plate between an outside of the housing and the working deck plate slot. The first transfer interface or a second interface can be brought in communication with a second storage module for storing lab-ware or liquid material.

Process module for an automated biology system

A method is employed to separate a carbon structure, which is disposed on a seed structure, from the seed structure. In the method, a carbon structure is deposited on the seed structure in a process chamber of a CVD reactor. The substrate comprising the seed structure () and the carbon structure () is heated to a process temperature. At least one etching gas is injected into the process chamber, the etching gas having the chemical formula AOX, AOXYor AX, wherein A is selected from a group of elements that includes S, C and N, wherein O is oxygen, wherein X and Y are different halogens, and wherein m, n and p are natural numbers greater than zero. Through a chemical reaction with the etching gas, the seed structure is converted into a gaseous reaction product. A carrier gas flow is used to remove the gaseous reaction product from the process chamber.

Method for separating a carbon structure from a seed structure

A device is provided for depositing carbonaceous structures, for example layers in the form of nanotubes or graphene on a substrate, which is supported by a substrate support disposed in a process chamber housing. A process gas can be delivered onto the substrate through gas outlet openings of a gas inlet element disposed in the process chamber housing. The process chamber housing has two opposing walls which each have holding recesses. At least one plate-shaped component is disposed in the process chamber housing. The plate-shaped component has two edge portions directed away from one another that each are inserted respectively in the holding recess of one of the two opposing walls.

Device for depositing nanotubes

Provided is a method of epitaxial deposition, which involves dry-etching a semiconductor substrate with a fluorine containing species and exposing the dry-etched substrate to hydrogen atoms, prior to epitaxially depositing a semiconductor layer to the surface of the substrate.

Preparing a semiconductor surface for epitaxial deposition

A plasma system for substrate processing comprising, a conducting electrode (b, bb) on which one or more substrates (d) can be held; a second conducting electrode (a) placed adjacent but separated from the substrate holding electrode on the side away from the side where the substrates are held; and a gas mixture distribution shower head (e) placed away from the conducting electrode on the side where the substrates are held for supplying the gas mixture (f) needed for processing the substrates in a uniform manner; such that a plasma configuration initiated and established, between the conducting electrode holding the substrates and the second conducting electrode envelops the electrode holding the substrate, is kept away from the shower head activating and distributing the gas mixture through orifices (ee) in the shower head, thereby providing the advantages of improved uniformity, yield and reliability of the process.

Plasma system for improved process capability

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Cambridgeshire, United Kingdom

Kenneth B K Teo