Mitsubishi Denki Kabushiki Kaisha

Mitsubishi Denki K.k.

Kenji Yoshizawa

Junichi Nishimae

Masaki Kuzumoto

Masakazu Taki

Hitoshi Kodama

Akihiko Iwata

Takashi Yamamoto

Isao Shoda

Yushi Takenaka

Kazuo Magome

Shigenori Yagi

Youichiro Tabata

Tateki Ozawa

Masahiro Mukai

Junji Ochi

Hiroshi Ito

Masato Matsubara

Koji Yasui

Akihiro Otani

Hirotsugu Komura

Yoshihiro Ueda

Keisuke Namba

Masao Oda

Kenji Kumamoto

Yoshimi Kinoshita

Yoshibumi Minowa

Toshiyuki Kobayashi

Masao Koshinaka

Susumu Maeda

Kazushi Ohnuki

Tadashi Yanagi

There is provided a highly efficient and compact ozone generating apparatus in which a very short air gap of about 0.2 mm is formed at high accuracy. Non-discharge portions are dispersed and disposed to cover an entire discharge space, or a spacer is provided to form the non-discharge portion. Further, an elastic body is mounted on a back face of an electrode, thereby enhancing an air gap accuracy of the discharge space.

Ozone generating method

Ozone generating apparatus

A laser system wherein, in order that a high-output and high-quality single mode of a cross sectional area larger than the beam diameter determined by the construction of a resonator can be obtained stably, although this has heretofore been impossible, there is used a coupling mirror provided with a partial reflection film and an antireflecting film, a laser beam mode is selected using the partial reflection film, a phase difference between laser beam portions caused by a difference in construction between the partial reflection film and the antireflecting film is compensated using a phase difference compensating means, and there is formed an aperture whose diameter is set to a value of not larger than four times the diameter of the partial reflection film.

Laser system

A laser system wherein, in order that a high-output and high-quality single mode of a cross sectional area larger than the beam diameter determined by the construction of a resonator can be obtained stably, although this has heretofore been impossible, there is used a coupling mirror provided with a partial reflection film and an antireflecting film, a laser beam mode is selected using the partial reflection film, a phase difference between laser beam portions caused by a difference in construction between the partial reflection film and the antireflecting film is compensated using a phase difference compensating apparatus, and there is formed an aperture whose diameter is set to a value of not larger than four times the diameter of the partial reflection film.

Laser system with transverse mode selecting output coupler

According to the present invention there is provided a laser apparatus capable of efficient oscillation with an excitation power source with comparatively low frequency, wherein discharge is obliquely generated within the rectangular section of a discharge space. There is also provided a laser apparatus with a pair of preliminary discharge excitation electrodes which can readily initiate discharge. There is further provided a laser apparatus capable of efficient oscillation with an excitation power source with comparatively low frequency, wherein provided is a pair of discharge excitation electrodes located in the major side direction of discharge space whose length is more than three times as long as that of minor side direction thereof. There is further provided a laser apparatus with a pair of discharge excitation electrodes whose dimension is smaller than that of a pair of dielectric plates, which apparatus can prevent undesirable discharge. There is also provided a laser apparatus with more than three discharge spaces at least one of which is given a lower electric field having the apparatus oscillate efficiently. There is further provided a laser apparatus with an improved oscillation efficiency wherein furnished are dielectric double pipes creating a substantially large discharge space.

Laser apparatus

A laser apparatus includes an unstable resonator having a total reflection mirror and a take-out mirror, and further includes shading means for shading a disturbed phase portion of a laser beam so as to derive exclusively a light having a uniform phase by shading the disturbed phase portion of the beam emitted from the resonator or the beam in the resonator.

Laser apparatus includes an unstable resonator and a shading means

Laser apparatus having a rectangular section

A microwave plasma apparatus comprises a discharge chamber for generating a plasma. A dielectric plate is placed on a surface of the discharge chamber. A microwave circuit surrounds the longitudinal side surface of the dielectric plate and the microwave circuit is adapted to couple the signal propagating therein to the dielectric plate, whereby a microwave electric field is formed within the discharge chamber to generate a plasma therein. The microwave circuit may comprise a rectangular waveguide, and a part of a wall surface of the rectangular waveguide is utilized as a terminal portion.

Microwave plasma apparatus for generating a uniform plasma

A microwave discharge light source device in which one side of a discharge space in which a plasma emission takes place is defined by a transparent dielectric member. A transparent microwave reflecting member is disposed in a position such as to face the discharge space through the dielectric member. A microwave having an electric field component in the direction of thickness of the dielectric member is introduced into the dielectric member through the coupling at an end surface of the dielectric member so that a microwave electric field is formed in the discharge space, and so that the plasma emission medium emits light by electric discharge. The light thus emitted is extracted through the transparent microwave reflecting member.

Microwave discharge light source device

A power supply circuit for a magnetron adapted to supply microwave energy to an electrodeless discharge bulb is disclosed. The circuit includes a rectifier coupled across a commerical AC voltage source, a filter for smoothing the output of the rectifier, an inverter for converting the DC voltage supplied from the filter into a high frequency AC voltage, a step-up transformer for stepping up the high frequency AC voltage outputted from the inverter, and a rectifier which rectifies the high voltage AC output of the transformer into a unidirectional voltage which is supplied to the magnetron. The inverter switching is controlled by a pulse width modulation control circuit to maintain the magnetron output power at a predetermined level. According to one aspect, an inductance is provided in the circuit which supresses high frquency components in the current flowing through the windings of the transformer; according to another aspect, the inverter switching frequency (expressed in kHz) is set at a value not less than 1500/D, wherein D represents the diameter of the electrodeless bulb expressed in millimeters; according to still another aspect, the peak to the mean value ratio of the magnetron current is limited under 3.75 inclusive.

Power supply for microwave discharge light source

A power supply circuit for a magnetron adapted to supply microwave energy to an electrodeless discharge bulb is disclosed. The circuit includes a rectifier coupled across a commercial AC voltage source, a filter for smoothing the output of the rectifier, an inverter for converting the DC voltage supplied from the filter into a high frequency AC voltage, a step-up transformer for stepping up the high frequency AC voltage outputted from the inverter, and a rectifier which rectifies the high voltage AC output of the transformer into a unidirectional voltage which is supplied to the magnetron. The inverter switching is controlled by a pulse width modulation control circuit to maintain the magnetron output power at a predetermined level. According to one aspect, an inductance is provided in the circuit which supresses high frequency components in the currents flowing through the windings of the transformer; according to another aspect, the inverter switching frequency (expressed in kHz) is set at a value not less than 1500/D, wherein D represents the diameter of the electrodeless bulb expressed in millimeters; according to still another aspect, the peak to the mean value ratio of the magnetron current is limited under 3.75 inclusive.

A gas laser device comprises a discharge space in which a laser gas is excited by electric discharge, the discharge space being in the form of a slab whose section perpendicular to a laser optical axis has a longer side and a shorter side; and laser resonator mirrors disposed at both ends of the discharge space, respectively. The laser resonant mirrors constitute a negative branch unstable resonator in a first dimension of longer side of the discharge space section, and a laser beam is obtained at one end of the longer side of the discharge space section.

Gas laser device

An apparatus for forming a thin film on a substrate by bringing a first gas and a second gas into reaction with each other in a reaction chamber near the surface of the substrate in the reaction chamber. The apparatus has a plasma generating chamber disposed adjacent to the reaction chamber for generating a plasma of the first gas in a predetermined direction. A first gas inlet is provided at the boundary between the plasma generating chamber and the reaction chamber and formed to extend in the predetermined direction, while a second gas inlet is provided in the vicinity of the first gas inlet and extended in the predetermined direction. The apparatus further has a first gas supplying device for introducing the first gas into the plasma generating chamber and for introducing the first gas activated by a plasma in the plasma generating chamber into the reaction chamber through the first gas inlet, and second gas supplying device for supplying the second gas into the reaction chamber through the second gas inlet. A first flow settling device having plates disposed transverse to the flow of the first gas is positioned between the first gas inlet and plasma chamber. A second flow settling device may be located between the second gas supplying device and second gas inlet.

Thin film forming apparatus having a gas flow settling device

Growing community of inventors

Hyogo, Japan

Kenji Yoshizawa