Canon Kabushiki Kaisha

Kenji Yamamoto

Mitsuhiro Masuda

Noburu Takakura

An information processing apparatus outputs correction data using a first system that outputs the correction data for correcting a condition defining processing to be performed in a lithography apparatus that forms a pattern onto a substrate. The first system includes a first model that outputs the correction data in case where a processing result indicating a result of the processing is input, and a second model that outputs the processing result in case where the condition is input. The first system corrects the condition using the correction data output from the first model, and outputs the correction data based on the processing result output by inputting the corrected condition to the second model.

Information processing apparatus, storage medium, lithography apparatus, manufacturing method of product, and manufacturing system of product

A substrate processing system having a plurality of substrate processing apparatuses, a host control apparatus, and a management apparatus is provided. The management apparatus determines a substrate processing apparatus that needs maintenance processing, based on operation information collected from each of the substrate processing apparatuses, and notifies a determination result to the substrate processing apparatus determined to need the maintenance processing. Each of the substrate processing apparatuses transmits information for executing the maintenance processing to the host control apparatuses upon receiving the determination result. The host control apparatus monitors an operation state of each of the substrate processing apparatuses, and, based on the operation state of the substrate processing apparatus that transmitted the information for executing the maintenance processing, controls a timing of performance of the maintenance processing with respect to the substrate processing apparatus.

Substrate processing system, method of controlling substrate processing system, computer-readable storage medium, and method of manufacturing article

The present invention provides an imprint apparatus comprising a plurality of processing devices configured to perform imprint processes for a plurality of substrates in parallel, and a controller configured to control the plurality of processing devices, wherein the controller is configured to control the plurality of processing devices so that each of the plurality of processing devices performs imprint processes for a plurality of regions whose positions correspond to each other over the plurality of substrates, and so that the plurality of processing devices respectively perform imprint processes for a plurality of regions whose positions are different from each other and which have shapes corresponding to each other in a single substrate.

Imprint apparatus, and method of manufacturing article

The present invention provides an imprint apparatus which transfers the pattern of the mold to a target region on the substrate, comprising a control unit configured to align the mold and the target region in a surface direction parallel to a surface of the substrate, and drive at least one of the mold and the substrate so that the mold and an imprint material on the target region are brought into contact with each other, wherein in the alignment in the surface direction before the contact, the control unit shifts a relative position between the mold and the target region based on a shift amount of the pattern of the mold from the target region in the surface direction in the driving which causes the contact, so that the relative position after the contact is set within an allowable range.

Growing community of inventors

Utsunomiya, Japan

Kenji Yamamoto