Fujifilm Corporation

The University of Tokyo

Kenji Shirokane

Yusuke Fujii

Tetsuya Watanabe

Junichi Takeya

Toshihiro Okamoto

Yukio Tani

Michio Arai

Takeshi Miyato

Shoichiro Kobayashi

Yoshihisa Usami

Toshihiro Ise

Tomoaki Yoshioka

Katsumi Kobayashi

Kousuke Watanabe

Eiji Fukuzaki

Naoyuki Hanaki

Kouitsu Sasaki

Ayato Sato

Hirotaka Satou

Fumiko Tamakuni

Provided are an ink for an impermeable base material, including an aqueous medium and resin particles, in which a resin of the resin particles has a glass transition temperature of −40° C. or higher and 85° C. or lower, the resin has at least one selected from the group consisting of a unit (1) to a unit (3), and at least one of an acid group or a salt of the acid group, an acid value of the resin is 0.10 mmol/g or greater and 2.65 mmol/g or less, and a proportion of a solvent having a boiling point of 250° C. or higher in the aqueous medium is 3% by mass or less, and an image recording method. Rrepresents a hydrogen atom or a C1 to C4 alkyl group, Arepresents —NH— or —N(L-Y)—, Land Lrepresent a divalent group or a single bond, Lrepresents a divalent group, and Yto Yrepresent a monovalent group.

Ink for impermeable base material and image recording method

A pretreatment liquid is a pretreatment liquid to be used for a pretreatment that is performed on an impermeable base material before an image is recorded on the impermeable base material, including a resin and an aqueous medium, in which the resin has at least one selected from the group consisting of a structural unit (1), and a structural unit (2), a glass transition temperature of the resin is −40° C. or higher and lower than 100° C., and a content of an alkyl (meth)acrylate unit containing a C2 or more chain alkyl group in the resin is less than 5% by mass. In the formulae, Rrepresents a hydrogen atom or a C1 to C4 alkyl group, Arepresents —NH— or —N(L-Y)—, Land Lrepresent a divalent group or a single bond, Lrepresents a divalent group, Yand Yrepresent a monovalent group such as an alkyl group, and Yrepresents a monovalent group such as —OH.

Pretreatment liquid, ink set, base material for image recording, method of producing base material for image recording, image recording material, and image recording method

Provided is an image recording method including applying a pretreatment liquid containing water and a resin X and an ink containing water and a colorant onto a resin base material A which has a specific distortion rate and to which a tension is applied, to obtain an image, heating the image to a temperature Tand drying the image, and cooling the image to a temperature T, in which σcalculated by Equation (1) is 40 kgf/cmor less. E(T) represents an elastic modulus of the resin X at the temperature T, ε(T) represents an expansion coefficient of the resin base material A under specific conditions, E(T) represents an elastic modulus of the resin X at a temperature T of the image in the cooling, α(T) represents a linear expansion coefficient of the resin X at the temperature T, and α(T) represents a linear expansion coefficient of the resin base material A under specific conditions.

Image recording method

A pretreatment liquid is a pretreatment liquid to be used for a pretreatment that is performed on an impermeable base material before an image is recorded on the impermeable base material, containing an aggregating agent, an aqueous medium, and a resin, in which the resin has at least one selected from the group consisting of a structural unit (1), a structural unit (2), and a structural unit (3), and a glass transition temperature of the resin is &#x2212;40&#xb0; C. or higher and lower than 100&#xb0; C. In the formulae, Rrepresents a hydrogen atom or a C1 to C4 alkyl group, Arepresents &#x2014;NH&#x2014; or &#x2014;N(L-Y)&#x2014;, Land Lrepresent a divalent group or a single bond, Lrepresents a divalent group, Yand Yrepresent a monovalent group such as an alkyl group, and Yrepresents a monovalent group such as &#x2014;OH.

Provided is an image recording method including applying an ink containing water, a resin X, and a colorant onto a resin base material A which has a specific distortion rate and to which a tension is applied, to obtain an image, heating the image to a temperature Td and drying the image, and cooling the image to a temperature Tr, in which &#x3c3;calculated by Equation (1) is 40 kgf/cmor less. E(T) represents an elastic modulus of the resin X at the temperature T, &#x3b5;(T) represents an expansion coefficient of the resin base material A under specific conditions, E(T) represents an elastic modulus of the resin X at a temperature T of the image in the cooling, &#x3b1;(T) represents a linear expansion coefficient of the resin X at the temperature T, and &#x3b1;(T) represents a linear expansion coefficient of the resin base material A under specific conditions.&#x3c3;=|&#x3c3;+&#x3c3;|&#x2003;&#x2003;Equation (1)&#x3c3;()&#x3b5;()&#x2003;&#x2003;Equation (2)&#x3c3;=&#x222b;()(&#x3b1;()&#x2212;&#x3b1;())&#x2003;&#x2003;Equation (3)

Provided are a pretreatment liquid for recording an image on an impermeable base material with an aqueous ink, the pretreatment liquid including an aqueous medium, a resin a having a glass transition temperature of lower than 25&#xb0; C., and particles of a resin b having a glass transition temperature of 25&#xb0; C. or higher; an ink set; a base material for image recording; an image recorded material; a method of producing a base material for image recording; and an image recording method.

Pretreatment liquid, ink set, image recorded material, base material for image recording, method of producing base material for image recording, and image recording method

An organic semiconductor element in which an organic semiconductor layer contains a compound of Formula (1), a compound of Formula (2), and/or a compound of Formula (3) or contains a polymer having a structure of any one of formed by Formulae (8) to (10):  in which Xrepresents a nitrogen atom or CR, and rings A to B each represent a specific nitrogen-containing ring; Yrepresents an oxygen atom, a sulfur atom, CR, or NR; Vrepresents NR, an oxygen atom, a sulfur atom, or a selenium atom; Rto Reach represent a hydrogen atom or a substituent; Rrepresents a specific substituent, and p is an integer of 0 to 2; n represents 1 or 2; and * represents a bonding site.

Organic semiconductor element, organic semiconductor composition, method of manufacturing organic semiconductor film, organic semiconductor film, and compound and polymer using the same

Provided are an organic thin film transistor element comprising an organic semiconductor layer containing a specific polymer which has a repeating unit including a structure represented by a specific formula, an organic semiconductor film suitable as the organic semiconductor layer and a method of manufacturing the same, and a polymer and a composition suitable as a constituent material of the organic semiconductor film.

Organic semiconductor element, organic semiconductor composition, organic semiconductor film, method of manufacturing organic semiconductor film, and polymer using the same

Provided are a photoelectric conversion element including a first electrode having a photosensitive layer including a light absorber on a conductive support and a second electrode facing the first electrode, in which the light absorber includes a compound having a perovskite-type crystal structure including organic cations, cations of a metallic atom other than elements belonging to Group I of the periodic table, and anions, and at least some of the organic cations constituting the compound are organic cations having a silyl group and a solar cell using the photoelectric conversion element. Also provided is a composition containing a compound represented by Formula (1a) and a halogenated metal.RSi-L-NRHal&#x2003;&#x2003;Formula (1a) In the formula, R, R, and L are specific groups. Hal represents a halogen atom.

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Kanagawa, Japan

Kenji Shirokane