Canon Kabushiki Kaisha

Nec Corporation

Mitsubishi Denki Kabushiki Kaisha

Kenji Saitoh

Masakazu Matsugu

Noriyuki Nose

Minoru Yoshii

Koichi Sentoku

Shigeyuki Suda

Takahiro Matsumoto

Hiroshi Yoshikawa

Akiyoshi Suzuki

Masanobu Hasegawa

Hiroshi Matsuda

Naoto Abe

Kunihiro Sakai

Ken Eguchi

Haruki Kawada

Yukichi Niwa

Kenji Yamazoe

Ryo Kuroda

Miyoko Kawashima

Hiroshi Osawa

Kazuyuki Ota

Naoki Nishimura

Toshihiko Miyazaki

Yoshinori Tomida

Mitsutoshi Ohwada

Makoto Ogusu

Toshiaki Kimura

Yusuke Mitarai

Ryuichi Ebinuma

Masaaki Shibata

Kunitaka Ozawa

Yukuo Nishimura

Hisaaki Kawade

Shunichi Uzawa

Hiroyasu Nose

Yoshihiro Yanagisawa

Akihiko Yamano

Eigo Kawakami

Nobutoshi Mizusawa

Mitsuaki Amemiya

Kiyoshi Takimoto

Mitsuro Sugita

Eiji Sakamoto

Takao Kariya

Yuko Morikawa

Masafumi Takimoto

Makoto Higomura

Sakae Houryu

Kohji Uda

Tetsunobu Kochi

Takashi Kato

Hiroyuki Shinbata

Kenichi Saito

Shigeru Harada

Takashi Nakagiri

Toshimitsu Kawase

Hiroshi Maehara

Keiko Chiba

Toshihiko Tsuji

Masaaki Imaizumi

Yoshiharu Tenmyo

Kazunori Iwamoto

Takeshi Okazawa

Jun Hattori

Takeshi Miyachi

Yoshihiro Hirata

Yuichi Iwasaki

Tetsuri Sonoda

Yumiko Ohsaki

Atsushi Kitaoka

Junichi Arima

Takeshi Noguchi

Reiji Tamaki

Toshimitsu Kawasa

Yoshiaki Ohtsu

Kazunori Okudomi

An information processing apparatus includes a projection unit configured to project a projection pattern onto an object, an imaging unit configured to capture an image of the object on which the projection pattern is projected, and a derivation unit configured to derive a three-dimensional shape of the object based on the image captured by the imaging unit. The projection pattern projected on the object by the projection unit includes a first pattern including a continuous luminance variation repetitively arranged at certain distances in a predetermined direction, and a second pattern having information for identifying the position of the measurement pattern in the captured image in an area between peaks in the measurement pattern.

Three-dimensional shape measuring apparatus, three-dimensional shape measuring method, program, and storage medium

A measurement apparatus includes an illumination light setting unit which sets illumination light having an optical characteristic corresponding to a microstructure which is formed on the surface of a measurement target and is to be measured, and a measurement unit which measures reflected light when the measurement target is irradiated with the illumination light. In addition, an extraction unit extracts, from the measured reflected light, information about the surface shape of the measurement target and the microstructure formed on the surface.

Measurement apparatus and method for measuring surface shape and roughness

This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.

Measurement system and measurement processing method

An information processing apparatus includes an obtaining unit configured to obtain first information regarding a distribution of reflected light from a target to be measured and second information regarding geometrical-optics components of the reflected light, a calculating unit configured to calculate third information on the basis of the first information and the second information, the third information indicating an approximation of the distribution of reflected light, and an output unit configured to output information regarding wave-optics components of the reflected light on the basis of the third information.

Information processing apparatus and method

An illumination device has a light source that supplies illumination light to an object to be illuminated and also has a corner cube member disposed at the opposite side of the light source with respect to the object to be illuminated. With this feature, efficient illumination of the object to be illuminated is achieved without need for high precision in positioning.

Corner cube member illumination device and inspection system having the same

At least one exemplary embodiment is directed to an illuminating apparatus, configured to uniformly illuminate a surface of an object, and includes a light-guiding member configured to guide light emitted from a source to a surface to be illuminated, and a reflecting member disposed between the light-guiding member and the surface to be illuminated. The reflecting member includes a pair of reflection surfaces disposed so as to face each other in a long side direction of the surface to be illuminated, and reflects light emitted from the light-guiding member in directions having directional components parallel to a short side direction of the surface to be illuminated toward the surface to be illuminated.

Illuminating apparatus and surface inspection system using illuminating apparatus

An illumination apparatus which illuminates a surface of an object having a three-dimensional shape includes a light source, a guide configured to guide light from the light source to a surface of the object, and a diffuser which has a diffusion-reflection surface that faces a light exit surface of the guide via the object, wherein the diffuser is arranged at such a position that the light which is emitted from the guide and is not directly incident on the object is incident on the diffusion-reflection surface while a part of the light reflected and diffused by the diffusion-reflection surface is incident on a surface of the object.

Illumination apparatus and appearance inspection apparatus including the same

An inspection apparatus includes a captured image acquiring unit configured to acquire a captured image that is acquired by shooting an inspection target, an acquiring unit configured to acquire from the captured image a first image region and a second image region whose intensity distributions of reflected light with respect to an incident angle of illumination light emitted to the inspection target are different, and an image processing unit configured to perform image processing for performing different surface inspections on the first image region and the second image region respectively.

Inspection apparatus and method

An illuminating apparatus includes a light source including a cylindrical light-emitting tube, a first optical system, a second optical system, and a third optical system. The first optical system has an incident surface on which light emitted from the light source to the object side are incident and an emergent surface from which the light passing through the incident surface are emitted. The second optical system has a reflecting surface from which light emitted from the light source to a first side are reflected. The third optical system has a reflecting surface from which light emitted from the light source to a second side opposite to the first side are reflected. The first to third optical systems each illuminate the entire illumination area of the object with light emitted from the light source and incident on the optical systems.

Illuminating apparatus and image sensing system including illuminating apparatus

Provided is an image pickup optical system capable of performing focusing in a wide region without a large increase in tilt angle in the case where an image of an object is picked up from a low angle. The image pickup optical system includes a first optical system and a second optical system, for enlarging an image formed by the first optical system and forming the enlarged image. A principal plane of the first optical system is tilted relative to an image plane of the second optical system.

Image pickup optical system

To realize a wireless imaging apparatus having excellent sensitivity to an environmental change, a wireless imaging device has an imaging unit with a function of imaging a subject and a communication unit with a wireless communication function. The imaging unit has, at least, an optical lens, an apertureto limit incident light from the optical lens, an optical sensorto convert the incident light passed through the apertureinto an electric signal, and an antenna for wireless communication, integrally formed with the aperture.

Wireless imaging apparatus and its control method

There is provided an exposure method that includes the steps of forming a phase shift mask having a desired pattern and a cyclic dummy pattern overlaid onto the desired pattern, a part of the desired pattern to be resolved by effects of the dummy pattern being thicker than the dummy pattern's line width, illuminating the phase shift mask by using illumination light having a peak near or on an optical axis in an intensity distribution to transfer the desired pattern onto the exposure plane by projecting light having passed through the phase shift mask onto the exposure plane.

Exposure method and apparatus

A mask manufacturing method suitable for an exposure method wherein a mask on which a desired pattern and a supplementary pattern with formations smaller than those of the desired pattern are arrayed is illuminated, and the light which passed through the mask onto a member to be exposed is projected via a projection optical system, said method comprising a selecting step for selecting one of the following three supplementary patterns, a first supplementary pattern wherein said supplementary pattern is disposed at a position where a line extending in the vertical direction as to the pitch direction from a certain desired pattern hole of said desired pattern, and a line connecting the supplementary pattern hole closest to said certain desired pattern hole in the vertical direction with said certain desired pattern hole, intersect at an angle of 0&#xb0;, a second supplementary pattern wherein said angle is 0&#xb0; or more but less than 45&#xb0;, and a third supplementary pattern wherein said supplementary pattern supplementary pattern is disposed at a position where said is disposed at a position where said angle is 45&#xb0;.

Mask and manufacturing method thereof and exposure method

An image processing system or image processing method for performing image sensing by an image sensing unit having plural image sensing devices then outputting plural image data, wireless-transmitting the plural image data, and generating a combined image based on the wireless-transmitted plural image data.

Image processing system, method and program for image sensing using plural image sensing devices, wirelessly transmitting plural image data and processing the image data

Growing community of inventors

Yokohama, Japan

Kenji Saitoh