Transphorm Japan, Inc.

Fujitsu Semiconductor Limited

Kenji Nukui

Atsushi Yamada

Toshiya Sato

Shinichi Akiyama

Yoshitaka Watanabe

Tsutomu Hosoda

Yoichi Fujisawa

Yuuichi Satou

Mutsumi Katou

Tetsuya Itou

Toshihide Kikkawa

A method of manufacturing a semiconductor device includes laminating and forming an electron transit layer, an electron supplying layer, an etching stop layer, and a p-type film on a substrate sequentially, the p-type film being formed of a nitride semiconductor material that includes Al doped with an impurity element that attains p-type, the etching stop layer being formed of a material that includes GaN, removing the p-type film in an area except an area where a gate electrode is to be formed, by dry etching to form a p-type layer in the area where the gate electrode is to be formed, the dry etching being conducted while plasma emission in the dry etching is observed, the dry etching being stopped after the dry etching is started and plasma emission originating from Al is not observed, and forming the gate electrode on the p-type layer.

Semiconductor device and method of manufacturing a semiconductor device

A compound semiconductor device includes: a compound semiconductor layer; and a gate electrode formed above the compound semiconductor layer; and a source electrode and a drain electrode formed on both sides of the gate electrode, on the compound semiconductor layer, wherein the source electrode has a plurality of bottom surfaces along transit electrons out of contact surfaces with the compound semiconductor layer, and the plural bottom surfaces are located at different distances from the transit electrons, with the bottom surface closer to the gate electrode being more apart from the transit electrons.

Compound semiconductor device and method of manufacturing the same

A compound semiconductor device includes a substrate; a compound semiconductor layer formed on the substrate; a first insulating film formed on the compound semiconductor layer; a second insulating film formed on the first insulating film; and a gate electrode, a source electrode, and a drain electrode, each being formed on the compound semiconductor layer, wherein the gate electrode is formed of a first opening filled with a first conductive material via at least a gate insulator, and the first opening is formed in the first insulating film and configured to partially expose the compound semiconductor layer, and wherein the source electrode and the drain electrode are formed of a pair of second openings filled with at least a second conductive material, and the second openings are formed in at least the second insulating film and the first insulating film and configured to partially expose the compound semiconductor layer.

Compound semiconductor device and method of manufacturing same

Method of manufacturing a semiconductor device and semiconductor device

Method of manufacturing compound semiconductor device with gate electrode forming before source electrode and drain electrode

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Nakano, Japan

Kenji Nukui