Nikon Corporation

Other

Nippon Kogaku K.k.

Adv Antest Corporation

Sendai Nikon Corporation

Kenji Nishi

Kazuya Ota

Seiro Murakami

Yasuaki Tanaka

Naomasa Shiraishi

Masahiko Okumura

Nobutaka Magome

Shinji Wakamoto

Yoshiki Kida

Noriaki Tokuda

Toru Kiuchi

Hideo Mizutani

Kazuaki Suzuki

Toshihiko Tsuji

Masaharu Kawakubo

Shinichi Takagi

Osamu Tanitsu

Hiroshi Chiba

Tohru Kiuchi

Hiroaki Takeuchi

Makoto Uehara

Kazuo Ushida

Saburo Kamiya

Hidemi Kawai

Kyoji Nakamura

Yasuyuki Sakakibara

Masaaki Aoyama

Takashi Masuyuki

Hidekazu Kikuchi

Hiroki Okuno

Takuzo Kashima

Katsunobu Ogura

Wen Yung Wu

Chen-Pi Chang

Koji Hirashima

A burn-in board includes: a board; sockets mounted on the board; a connector mounted on the board; and wiring systems disposed in the board and connecting the sockets and the connector. The wiring systems comprise: a first wiring system that transmits a first signal; and a second wiring system that transmits a second signal different from the first signal, and a type of a first connection form of the first wiring system is different from a type of a second connection form of the second wiring system.

Burn-in board and burn-in apparatus

An image display device comprising a display portion that projects, via eyepiece optical systems which respectively correspond to each of the both eyes of a user, a light emitted from a two-dimensionally light emitting type photoelectric device which is perpendicular to the light beam emitting direction onto the eyeballs of said user, a supporting portion that supports the display portion at its portion that is not in contact with the user, and a face contact portion that is supported by the display portion and is capable of changing the distance between the eyepiece optical systems and the eyes of the user, whereby images with high image quality and high field angle are, in a space-saving manner, safely provided to the user, and, at the time, with the personal image display devices' disadvantages being saved, even multiple persons can enjoy the images.

Image display device and image display system

An image display device projects lights emitted from each of two two-dimensionally light emitting type photoelectric devices onto first and second light diffusing bodies, and projects and images transmitted images of the light diffusing bodies onto the retina in the respective eyeballs of the user. The display device includes one light source, a first polarization beam splitter dividing light emitted from the light source into P-polarized light and S-polarized light, and an optical system which leads each of the P-polarized light and S-polarized lights respectively to the two photoelectric devices thereby illuminating the two photoelectric devices. The optical system leads polarized light to each of the two photoelectric devices via a second polarization beam splitter and a &#x3bb;/4 plate, and leads reflected lights to the relay optical system via the &#x3bb;/4 plate and the second polarization beam splitter.

Image display device using P-polarized light and S-polarized light

The present invention provides, among other things, an information inputting tool that can be made space-saving and places small constraint on key touch actions. For that purpose, an information inputting tool of the present invention is provided with a reflection portion (B) provided with a single or a plurality of reflection members (C) having retroreflectivity, with an attaching gadget (etc.) that attaches said reflection portion to a finger of an operator, and with a change mechanism (S,, etc.) that changes the reflectance distribution of said reflection portion in accordance with a finger pressure applied to the finger end of said finger.

Information inputting tool, storage device, information inputting device, and information processing equipment

A scanning exposure apparatus includes a projection system, a stage system, a first detector and a control system. The stage system has first and second stages, each of which is movable independently in a plane while holding a substrate. The first detector detects focusing information of a vicinity of an outer circumference of the substrate during a detecting operation. The control system controls the stage system to perform the detecting operation with the first stage, while performing a first exposure operation on the substrate held by the second stage. After the first exposure operation, a second exposure operation for the substrate held on the first stage is performed, in which a shot area in the vicinity of the outer circumference of the substrate is exposed by moving the first stage while adjusting a position of the substrate surface held by the first stage using the detected focusing information.

Exposure apparatus and an exposure method

Exposure apparatus and method

An exposure apparatus for exposing a substrate with an exposure light beam passing through a mask comprises a movable stage for moving the substrate, a stage chamber for accommodating the movable stage, a transport system for transporting the substrate into the stage chamber, and a first alignment system for performing positional adjustment for the substrate with respect to the movable stage in the stage chamber. The position of an exposure objective delivered from the transport system into the stage chamber can be subjected to positional adjustment by using the first alignment system. The stage chamber and the movable stage can be assembled to a frame of the exposure apparatus in accordance with the module system. The exposure apparatus includes a second alignment system for performing positional adjustment for the substrate installed on the movable stage at an exposure position.

Exposure method, exposure apparatus, and method for producing device

After exposure of a divided area on a wafer is completed, for exposure of the next divided area, a control unit sends configuration information on control parameters necessary to expose the next divided area to a stage control system, sometime before the stage control system begins deceleration of a reticle stage and a wafer stage in a scanning direction. Therefore, both stages do not have to be suspended before acceleration for the stage control system to receive the configuration information on control parameters necessary to expose the next divided area, and since suspension time is not required, throughput can be improved. In this case, no serious problems occur, so the performance of other devices is not disturbed.

Exposure apparatus and stage device, and device manufacturing method

An intermediate image of an image from the LCD moduleis deflected by reflection mirrors Mand Mvia zoom automatic focus control system (g) and then is formed on diffusion glassvia relay lens (b) and reflection mirrors Mand M. The LCD image is projected on the retina of eyeballs via eyepiece lensby the light flux diffused at an order of &#xb1;20 degrees by diffusion glass. One side of the eyepiece lensclose to the crystal ballshas an aspherical shape of a Conic surface and a Conic coefficient of the Conic surface is &#x2212;1 and less. Thereby the optical system that has a viewing angle of 60 degrees and over and has a small aberration can be obtained.

Image display unit and projection optical system

Constant speed drive of a reticle and a wafer in a relative scanning direction and positioning of the reticle and the wafer are simultaneously performed with high precision by a slit scanning exposure scheme. A reticle side scanning stage for scanning a reticle relative to a slit-like illumination area in the relative scanning direction is placed on a reticle side base. A reticle side fine adjustment stage for moving and rotating the reticle within a two-dimensional plane is placed on the reticle side scanning stage. The reticle is placed on the reticle side fine adjustment stage. Constant speed drive and positioning of the reticle and a wafer are performed by independently controlling the reticle side scanning stage and the reticle side fine adjustment stage.

Projection exposure apparatus

A high exposure accuracy is obtained while mitigating the influence of vibration by using an exposure method and an exposure apparatus. Columns (A,B) are installed on a base plate (), a reticle base () is supported at the inside of the columns (A,B) by the aid of variable mount sections (A,B) having high rigidity, a finely movable stage () is movably placed on the reticle base () by the aid of air bearings, and a reticle (R) as an exposure objective is placed on the finely movable stage (). A coarsely movable stage () is hung on a bottom surface of a support plate () arranged over the reticle base () in a state capable of being driven in a scanning direction. The finely movable stage () is driven by the coarsely movable stage () in the scanning direction in a non-contact state with respect to the reticle base (). The finely movable stage () is finely driven with respect to the coarsely movable stage () by an actuator arranged between the coarsely movable stage () and the finely movable stage ().

Exposure method and apparatus with vibration-preventative control

An exposure apparatus has a triangular shaped stage which is movable in a two-dimensional plane while holding a substrate. The stage has a reflecting surface provided on a side face of the stage so that the surface extends in a specific direction intersecting Y axis and X axis. An interferometer radiates a beam onto the reflecting surface to measure a position of the stage in a direction perpendicular to the specific direction. Using the measured position and an angle of the specific direction, a calculator can calculate the position of the stage on rectangular coordinate system defined by X and Y axes. The size and weight of the stage can be reduced, and the throughput of the exposure apparatus is improved.

Stage apparatus, scanning type exposure apparatus, and device produced with the same

A scanning exposure apparatus includes a masking blade provided between an optical integrator and an optical system, and which is movable in a predetermined direction on a plane perpendicular to an optical axis of the optical system. The masking blade has a pair of edges substantially parallel to each other and perpendicular to the predetermined direction in the plane, and is moved so that the pair of edges are respectively imaged at a beginning and an end of scanning exposure onto a light shielding border by the optical system to change a width of an illuminated region with respect to a scan direction at both the beginning and the end of the scanning exposure.

In order to remove vibration or improve a vibration control effect, and achieve device size reduction, an adjusting device is provided in which a weight of a support target object is supported by a pressure of an internal gas of a first chamber gas via a holding member and which adjusts a position in a gravity direction of the holding member by driving a movable member which changes an internal volume of the first gas chamber by changing an internal volume of a second gas chamber based on a state change of at least one of first and second gas chambers. Because of this, when the holding member is displaced in the gravity direction because of the vibration or the like, as the movable member is driven by the adjusting device, the holding member is maintained at an original position. Additionally, the movable member does not contact the support target object, so it does not directly deform the support target object, and the support target object is only driven by the change of the internal volume of the gas chambers; thus, even if the rigidity of the gas within the first gas chamber is high, there will be no problem regarding transmission of vibrations.

Vibration control device, stage device and exposure apparatus

Growing community of inventors

Yokohama, Japan

Kenji Nishi