Kansai Paint Company, Ltd.

Institute of Microchemical Technology

Kenji Miyagawa

Kenji Seko

Junya Yoshitake

Mitsuru Ueda

Masaya Kakuta

Manabu Tokeshi

Takahide Takadera

Yoichi Yonehara

Hitoshi Izumida

Kazuo Yamanaka

Kazuya Ebara

An objective of the present invention is to provide immunoassay microchips in which microstructures of beads having a sufficient reaction area were constructed within microchannels while suppressing flow path resistance, and to provide simple and highly-sensitive immunoassay methods for microsamples. The objective was achieved by immunoassay microchips comprising microchannels with microstructures arranged in at least a portion of the microchannels, the microstructures retaining microbeads uniformly dispersed in photo-cured hydrophilic resins, and the microbeads having a primary antibody immobilized on their surfaces, and by immunoassay methods using the microchips.

Microchips, kits, and methods for immunoassays

This invention provides a process for the production of molded particles for enzyme- or microbial cell-immobilization which is characterized in that: an aqueous liquid composition which comprises: 

Process for the production of molded particles for enzyme- or microbial cell-immobilization

Polybenzoxazole precursor and coating composition using the same

Process for the production of molded particles for microbial cell-immobilization

A photosensitive resin composition for photoresist which is highly sensitive and can directly form an image using a laser is disclosed. Said composition comprises (A) an unsaturated resin having carboxyl group(s) which is obtained by firstly reacting 0.8 to 1.3 moles of an ethylenic unsaturated monocarboxylic acid with 1 mole of an epoxy group of a homopolymer or copolymer of ethylenic unsaturated monomer having an epoxy group to obtain an unsaturated resin which is then reacted with a dibasic acid anhydride, (B) ethylenic unsaturated compound without epoxy group, and (C) photopolymerization initiator.

Photosensitive resin compositions for photoresist

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Hiratsuka, Japan

Kenji Miyagawa