Mitsubishi Denki Kabushiki Kaisha

Mitsubishi Electric Semiconductor Software Corporation

Kenji Koda

Shinichi Mori

Akira Okugaki

Hiromi Sadaie

A semiconductor device having a multi-value memory including an offset ROM and a manufacturing method thereof can be obtained which allows accurate formation of a source/drain region and an offset region. In this semiconductor device, an offset source/drain region is provided so that a side end portion thereof is positioned substantially in flush with a lower end of an external surface of a sidewall insulating film placed on a side surface of a first gate electrode. Consequently, the offset source/drain region can be formed easily in a self-aligned manner by ion implantation using the sidewall insulating film as a mask, thereby forming the offset region accurately in a self-aligned manner.

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Hyogo, Japan

Kenji Koda