Kyoto Electronics Manufacturing Company, Limited

Screen Holdings Co., Ltd.

Dainippon Screen Mfg. Co., Ltd.

Kenji Kawaguchi

Toru Endo

Kota Tanikawa

Akio Hashizume

Yuya Akanishi

Manabu Yamamoto

Masanori Yasuda

Toshiyuki Shimizu

Nami Kurauchi

Masanobu Obayashi

Toshiro Kita

The substrate processing apparatus includes: a nozzle having a spout and adapted to spout SPM from the spout toward a substrate; a mixing portion communicating with the spout; a sulfuric acid-containing liquid supply device which recovers liquid supplied to and expelled from the substrate held by a substrate holding unit, prepares a sulfuric acid-containing liquid from the recovered liquid, and supplies the prepared sulfuric acid-containing liquid to the mixing portion; and a control device. The control device performs: a sulfuric acid-containing liquid preparing step of recovering SPM supplied to and expelled from the substrate and preparing the sulfuric acid-containing liquid; and an SPM spouting step of supplying the prepared sulfuric acid-containing liquid and hydrogen peroxide water to the mixing portion, mixing the sulfuric acid-containing liquid and hydrogen peroxide water together in the mixing portion to prepare SPM, and spouting the prepared SPM from the spout.

Substrate processing device and substrate processing method

A substrate treatment apparatus is provided, which includes: a seal chamber including a chamber body having an opening, a lid member provided rotatably with respect to the chamber body and configured to close the opening, and a first liquid seal structure which liquid-seals between the lid member and the chamber body, the seal chamber having an internal space sealed from outside; a lid member rotating unit which rotates the lid member; a substrate holding/rotating unit which holds and rotates a substrate in the internal space of the seal chamber; and a treatment liquid supplying unit which supplies a treatment liquid to the substrate rotated by the substrate holding/rotating unit.

Substrate treatment apparatus

Substrate treatment apparatus and substrate treatment method

In order to measure specific heat, the measurement time is very long and the instrument is very expensive. The specific heat may be calculated based on the thermal time constant obtained from the change of the sample temperature when the predetermined amount of sample with known density at the first temperature is introduced in the environment at the second temperature. This measuring method can use the oscillatory densitometer. The predetermined amount corresponds to the volume of the sample to be introduced in the oscillatory densitometer, the density is a measurement result of the oscillatory densitometer, and the thermal time constant corresponds to the time constant of the oscillation period of the oscillatory densitometer.

Specific heat measuring method and instrument

The invention relates to a method and apparatus for measuring a speed of an ultrasonic: wave propagated in a sample, even if there are bubbles in a sample. And it presupposes an ultrasonic speed measuring method for seeking a sonic speed in a sample in accordance with the propagation time of an ultrasonic wave propagated between an ultrasonic transmitter and an ultrasonic receiver by transmitting the ultrasonic wave from the ultrasonic transmitter. The apparatus of this invention is arranged that continuous oscillating waves are oscillated synchronizing the phase only with the receipt timing of at least one of receiving waves received by the ultrasonic receiver at every transmitting waves, and according to the continuous oscillating waves it is possible to measure the period of pulses oscillated by the local oscillator for determining the transmit timing.

Ultrasonic sound velocity measuring method and its apparatus

Method for deciding the viscosity in the density measurement

An oscillation period of an oscillating tube of an oscillatory densimeter is detected while the oscillation of the oscillating tube is maintained by applying an external force in the form of a pulse signal to the oscillating tube in one direction each time the tube passes the original place in that direction so that a stable oscillation free from any influential distortion can be obtained.

Method of detection of oscillation period for oscillatory densimeter

An oscillation period of an oscillating tube of an oscillatory densimeter is detected while liquids of which densities are to be measured are introduced into the oscillating tube. When the oscillation period exceeds a predetermined threshold, a time for which the introduction of liquids should be further continued is determined by multiplying the time from the start of the introduction to occurrence of the exceeding by a predetermined ratio.

Growing community of inventors

Kyoto, Japan

Kenji Kawaguchi