Kabushiki Kaisha Toshiba

Kenji Kawabata

Yoshiyuki Shioyama

Hiroshi Watanabe

Hiroshi Matsushita

Hisataka Meguro

Takashi Ichikawa

Kenichi Kadota

Ai Omodaka

In accordance with an embodiment, a simulation apparatus includes a two-dimensional section dividing processing unit, a two-dimensional simulator, a one-dimensional combining processing unit, and a three-dimensional shape combining processing unit. The two-dimensional section dividing processing unit divides a three-dimensional shape as a simulation target into at least one set of two-dimensional sections intersecting with each other and defines the three-dimensional shape as the two-dimensional sections. The two-dimensional simulator runs a two-dimensional shape simulation in each time step for each of the two-dimensional sections obtained by the dividing and acquires a two-dimensional shape. The one-dimensional combining processing unit extracts a film configuration for each intersection of the two-dimensional sections from the acquired two-dimensional shape and combines the film configurations to acquire one-dimensional film configurations. The three-dimensional shape combining processing unit creates a three-dimensional structure from the acquired one-dimensional film configurations on the basis of information on the intersection.

Simulation apparatus, simulation method and non-transitory computer readable recording medium

A multi-dot flash memory includes active areas arranged in a first direction, which extend to a second direction crossed to the first direction, the first and second direction being parallel to a surface of a semiconductor substrate, floating gates arranged in the first direction, which are provided above the active areas, a word line provided above the floating gates, which extends to the first direction, and bit lines provided between the floating gates, which extend to the second direction. Each of the floating gates has two side surfaces in the first direction, shapes of the two side surfaces are different from each other, and shapes of the facing surfaces of the floating gates which are adjacent to each other in the first direction are symmetrical.

Multi-dot flash memory and method of manufacturing the same

A semiconductor storage device includes: a substrate having a semiconductor layer at least on a surface thereof; and a plurality of quantum dot elements forming a charge storage layer formed above the semiconductor layer via a first insulating film that becomes a tunnel insulating film in such a manner that the quantum dot elements are connected with a bit line in series, wherein each quantum dot element forms a single electron memory.

Semiconductor storage device and manufacturing method thereof

A semiconductor storage element includes: a semiconductor layer constituted of a line pattern with a predetermined width formed on a substrate; a quantum dot forming an electric charge storage layer formed on the semiconductor layer through a first insulating film serving as a tunnel insulating film; an impurity diffusion layer formed in a surface layer of the semiconductor layer so as to sandwich the quantum dot therebetween; and a control electrode formed on the quantum dot through a second insulating film.

Semiconductor storage element and manufacturing method thereof

A failure analysis method according to the invention includes inputting the positions of failures in multiple wafers of an input device; preparing multiple sections in the multiple wafers; calculating feature amounts, which are represented by at least one numerical value representing a distribution of the failures in the multiple wafers, for each of the multiple sections; and representing by a first numerical value, the degree of similarity between the multiple wafers in terms of the feature amounts. Subsequently, the method includes detecting another wafer, which has the first numerical value greater than a predetermined first threshold, for each of the multiple wafers and forming a similar wafer group of multiple wafers with similar distributions of the failures.

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Yokohama, Japan

Kenji Kawabata