Terumo Kabushiki Kaisha

Tokyo Electron Limited

Shin-etsu Chemical Co., Ltd.

Tokyo Electron Yamanashi Limited

Tokyo Electoron Limited

Ihi Corporation

Tokyo Electron Kabushiki Kaisha

Tokyo Electron Tohoku Limited

Kenji Ishikawa

Junichi Arami

Nobuo Kawada

Mitsuaki Komino

Masaaki Kasai

Shiro Koyama

Isao Yanagisawa

Kouichi Kazama

Hideaki Kitou

Yoshihide Toyokawa

Masayuki Kitamura

Satoru Kawakami

Kenichi Shimura

Naoki Ishii

Teruo Iwata

Kuniaki Iizuka

Yoshifumi Tahara

Makoto Onishi

Yoichi Deguchi

Takaaki Nagao

Shoji Kano

Akira Mochizuki

Harunori Ushikawa

Hiroshi Mogi

Izumi Arai

Toshiya Asai

Hironori Yagi

Yasunobu Zushi

Yoichi Ueda

Yoshihiro Yokoo

Yasushi Asada

Toshihiko Kitazawa

Yoshimitsu Asada

Osamu Kagimoto

Masashige Takahashi

Yohei Suruga

Youichi Deguchi

Masatoshi Eguchi

Suguru Katayama

Asako Yasui

Shinichi Kora

Osami Shinonome

Masami Kubota

Kazuhiko Urano

Toshihiko Shindoh

Takayasu Shimazaki

Nobuo Arai

Koji Hagiwara

Masahide Watanabe

Tadashi Mitui

Takanori Sakurai

Taku Aoike

A shaft includes: two large-diameter portions; and a small-diameter portion formed between the two large-diameter portions. A bearing includes: an annular body in which to insert the shaft; two bearing surfaces being opposite the large-diameter portions; and an intervening surface located between the two bearing surfaces on an inner circumferential surface of the body, and being opposite the small-diameter portion with a clearance formed between the intervening surface and the small-diameter portion. No anti-corrosion treatment is applied to the large-diameter portions. An anti-corrosion treatment is applied to at least any one of: an exposed portion of an outer peripheral surface of the body of the bearing, which is exposed to the outside of the housing; the intervening surface of the bearing; an opposite end surface of the bearing; and the small-diameter portion of the shaft.

Bearing structure and turbocharger

The present invention provides an intravascular catheter comprising a catheter part; an internal needle disposed through the catheter part; and a flexible resin member disposed on the outer surface of the catheter part. It is preferable that the intravascular catheter comprises a blood leakage prevention member for preventing leakage of blood by closing the catheter part via the flexible resin member. It is also preferable that the blood leakage prevention member comprises a pressure part capable of pressuring the catheter part via the flexible resin member. It is further preferable that the blood leakage prevention member comprises a fixing mechanism capable of fixing the pressure part in the pressuring state, and a releasing mechanism capable of releasing the pressuring state.

Intravascular catheter

An indwelling catheter is made of a polyurethane resin having a Shore hardness of 60D or more. The soft segment of the polyurethane resin is constituted by polycaprolactone. The indwelling catheter has a kinking resistance of 10 mm or more when measured at 37.degree. C. in wet state. The Young's modulus is at first 20 kgf/mm.sup.2 or more when measure at 25.degree. C. in dry state, and reduces to 15 kgf/mm.sup.2 or less by soaking it in water of 37.degree. C. for 5 minutes or less.

Indwelling catheter with improved kinking resistance

A one-by-one type heat-processing apparatus is disclosed. The one-by-one type heat-processing apparatus includes a processing vessel for processing a semiconductor wafer. A susceptor having a support surface for placing the semiconductor wafer is arranged in the processing vessel. A shower head section is arranged at an interval with respect to the support surface of the susceptor. Processing gas supply pipes for supplying a processing gas are independently connected to the shower head section. A plurality of gas injection holes are formed in the shower head section. First to third heating means for heating the susceptor are attached to the susceptor. The first heating means having a disk-like shape is arranged at almost the center on the lower surface side of the susceptor. The second heating means is concentrically arranged to surround the first heating means. The third heating means is arranged at the peripheral edge portion of the susceptor. The diameter of a gas injection region having the plurality of gas injection holes on the surface of the shower head section opposite to the susceptor is substantially equal to the diameter of the third heating means. The apparatus also includes a central control section capable of independently controlling the first to third heating means.

One-by-one type heat-processing apparatus

This invention provides a medical device in which its lubricity is continually maintained and its safety is guaranteed. Particularly, it provides a medical device in which lubricity is generated on at least a portion of its surface when the device is contacted with body fluids or exposed to physiological aqueous conditions, wherein the lubricity-generating portion is formed by thermoforming.

Thermoformed medical device with lubricious modified polyethylene oxide

A heating device is formed by a heating plate formed of silica and having a heating surface for heating an object to be heated, a heating element having a predetermined pattern and fixed to a surface opposing the heating surface of the heating plate, and a reflecting plate formed of silica and brought into tight contact with the surface of the heating plate on which the heating element is formed. This heating device is arranged in a processing vessel in a CVD apparatus, and a semiconductor wafer is placed on the heating device. A process gas is supplied into the processing vessel while the semiconductor wafer is heated, thereby forming a predetermined film on the semiconductor wafer.

Heating device, method of manufacturing the same, and processing

A ceramic electrostatic chuck with a built-in heater having electrodes of an electroconductive ceramic bonded to a surface of a supporting substrate of an electrically conducting ceramic. A heat generating layer of an electroconductive ceramic is bonded to the other surface of the supporting substrate and a covering layer of an electrically insulating ceramic is provided thereon. Each of the supporting substrate, electrode for the electrostatic chuck and heat generating layer has a surface roughness Rmax of 5 .mu.m or larger.

Ceramic electrostatic chuck with built-in heater

A static chuck and a workpiece push-up pin are disposed on a susceptor which is one of opposed electrodes generating plasma. The push-up pin and the susceptor are electrically connected. A grounding circuit which discharges electric charges remaining on the susceptor is disposed in parallel with an RF power supply circuit which supplies RF power to the susceptor. Thus, electric charges remaining in the power supply circuit can be discharged and an abnormal discharging between the push-up pin and the susceptor can be prevented.

Plasma treatment apparatus having a workpiece-side electrode grounding

An electrostatic chuck of this invention includes a conductive film, an insulating coat formed on a susceptor to cover the conductive film, and a feeder circuit for applying a voltage to the conductive film to cause the insulating coat to generate an electrostatic attractive force. The feeder circuit includes a connecting conductor replacing a portion of the insulating coat to be electrically connected to the conductive film, a first feeder pin extending through the susceptor from its front surface side to its rear surface side and having one end portion electrically connected to the connecting conductor, an insulating member for insulating the first feeder pin from the susceptor, a second feeder pin having one end portion pressed against the other end portion of the first feeder pin to be electrically connected to the first feeder pin, and a power supply electrically connected to the second feeder pin.

Electrostatic chuck

A receptacle terminal is provided at a mount table and comprised of a downwardly opened electroconductive cap member. The receptacle terminal is connected to a heating element of a heater. A plug terminal is forced into the receptacle terminal and has an electroconductive section, support section and insulating pipe. The insulating pipe is provided around the circumference of the support section. A first clearance is defined between the support section and the inner wall of the insulating pipe. A second clearance is defined between the end face of the electroconductor section and that of the insulating pipe. The lower end portions of the support section and insulating pipe extend out of a processing chamber via a hole in the bottom plate of the processing chamber. A gas supply attachment is provided around the circumference of the insulating pipe and has a cavity including the circumferential portion of the insulating pipe and communicating with a gas supply pipe. The cavity communicates with the first clearance via a hole partially provided in the insulating pipe at the cavity. The gas supply pipe communicating with the cavity is connected to an inert gas supply source. The inert gas is supplied from an inert gas supply source to a region near a contacting area of the receptacle terminal and plug terminal past the cavity, first clearance and second clearance.

Processing apparatus

A vacuum processing apparatus includes: a processing chamber for performing a film formation process to a semiconductor wafer in a vacuum; a mounting member provided in the processing chamber and having a mounting surface for mounting a target object; an electrostatic chuck, provided to the mounting surface of the mounting member, for chucking the semiconductor wafer; a heating mechanism for heating the semiconductor wafer; and a processing gas supply mechanism for supplying a processing gas for performing the film formation process to the semiconductor wafer into the processing chamber. The mounting member has a base, a first insulating layer formed on the surface of the base, and a second insulating layer formed on the first insulating layer, and has a conductive layer between the first insulating layer and the second insulating layer on the mounting surface side of the mounting member to obtain the above electrostatic chuck constituted by the first insulating layer, the second insulating layer, and the conductive layer, and the heating mechanism has a heating member provided between the first insulating layer and the second insulating layer on the lower surface side of the mounting member.

Vacuum processing apparatus

A susceptor of a plasma etching apparatus is arranged on a heater fixing frame incorporating a heater. The fixing frame is arranged on a cooling block containing liquid nitrogen. A boundary clearance is formed between the fixed frame and the cooling block and on a heat transfer path. A method of controlling the temperature of the susceptor includes an initialization mode, an idle mode following the initialization mode, process and maintenance modes selectively following the idle mode. The initialization mode includes the steps of filling the boundary clearance with a heat transfer gas and observing a change in temperature of the susceptor caused by cold transferred from the cooling block. The idle mode is executed after the temperature of the susceptor reaches a predetermined temperature. The idle mode includes the step of exhausting the boundary clearance to set it in a vacuum state to sever the heat transfer path. The process mode includes the steps of filling the boundary clearance with the heat transfer gas and processing a semiconductor wafer on the susceptor. The maintenance mode includes the steps of keeping the vacuum state of the boundary clearance to sever the heat transfer path and performing maintenance.

Method of controlling temperature of susceptor

The ceramic electrostatic chuck with built-in heater of the present invention is disclosed having electrodes for electrostatic chuck made from an electroconductive ceramic bonded to a surface of a supporting substrate made from an electrically insulating ceramic, a heat generating layer made from an electroconductive ceramic is bonded to the other surface and the side surface and a covering layer made from an electrically insulating ceramic is provided thereon.

A catheter or balloon catheter includes a tube or balloon which is provided with a plurality of pores. A stimulus-responsive polymer is attached to the pores so that fluid transmission through the pores is controllable by a stimulus such as a change of pH, composition, and temperature. The catheter can administer a necessary limited amount of medicament to a locally limited site of a blood vessel only when necessary.

Catheter with medicament injection pores

There is a disclosure of a method and a container for storing a blood or blood component, including a sheet material having a plurality of layers and wherein the layers are adhered to each other, at least a portion of the layer which contacts blood or blood components is composed of a block copolymer having a micro-phase separating structure. In accordance with the present invention, there is provided a container which has excellent properties in relation to the storage of platelet, gas permeability and mechanical strength. Also, there is a disclosure of a method and a tube for transfusing blood or a blood component, including a tube material having a plurality of the same layers as the above.

Container for storing blood or blood component

Growing community of inventors

Sagamihara, Japan

Kenji Ishikawa