Central Glass Company, Limited

Kenji Hosoi

Kensuke Hirotaki

Takeo Komata

Shinya Akiba

Hiroshi H Eguchi

Yukari Hara

Naoya Ueshima

Hiroto Hori

Yosuke Murakami

Hideaki Imura

Kei Matsunaga

Mineo Watanabe

Hirokatsu Nagura

Ayumi Yamaguchi

The present invention has the effect of making it possible to produce 1,1,1-trifluoro-2,2-bisarylethane efficiently by a simple procedure by condensing a mixture of fluoral and hydrogen fluoride with an aryl compound under anhydrous conditions. The purity of the 1,1, 1-trifluoro-2, 2-bisarylethane obtained can be raised by a simple purification method such as crystallization or distillation. The obtained 1,1,1-trifluoro-2,2-bisarylethane can be increased in purity by a simple purification method such as crystallization operation or distillation.

Method for producing 1,1,1-trifluoro-2,2-bisarylethane, and 1,1,1-trifluoro-2,2-bisarylethane

A polyimide which is obtained by a reaction of an aromatic diamine having a 1,1,1-trifluoro-2,2-ethanediyl group (—C(CF)H—), as a linkage skeleton, with a tetracarboxylic dianhydride is easily dissolved in an organic solvent and exhibits excellent film forming properties. In addition, the thus-obtained polyimide can be used for an optical film and a display device.

Polyamide acid, polyimide, optical film, display device and production methods thereof

A curable resin represented by General Formula (1). In General Formula (1), Reach independently represent a monovalent substituent (an alkyl group, an alkoxy group, a fluorine atom, and the like), m is 0 to 4, n is 0 to 40, and R's are each independently a monovalent group including a polymerizable functional group.

Curable resin, curable resin composition, cured product, electronic device, laminated board material, electronic component encapsulant, and method for producing curable resin

A halogenated &#x3b1;-fluoroether of the formula (2) (where HaloR represents haloalkyl; Rrepresents hydrogen, halogen, alkyl or substituted alkyl; and Rrepresents alkyl or substituted alkyl) is produced efficiently on an industrial scale by reacting a halogenated aldehyde of the formula (1) (where HaloR represents haloalkyl) or an equivalent thereof with hydrogen fluoride. 

Production method for halogenated alpha-fluoroethers

Fluoral is obtained by gas-phase fluorination of chloral in the presence of a catalyst and then reacted with trimethyl orthoformate, thereby readily forming 1,2,2,2-tetrafluoroethyl methyl ether as an intermediate for production of desflurane. 1,2,2,2-Tetrafluoroethyl difluoromethyl ether (desflurane) is produced with high yield from the thus-formed 1,2,2,2-tetrafluoroethyl methyl ether by chlorination and fluorination. This method enables efficient industrial-scale production of desflurane useful as an inhalation anesthetic.

Production method for 1,2,2,2-tetrafluoroethyl difluoromethyl ether (desflurane)

A benzyl vinyl ether represented by the following formula is hydrolyzed in the presence of a catalyst selected among Arrhenius acids and Lewis acids to obtain 3,3,3-trifluoropropionaldehyde. Subsequently, the 3,3,3-trifluoropropionaldehyde is oxidized with an oxidizing agent. Thus, 3,3,3-trifluoropropionic acid can be more advantageously produced than in conventional techniques from an inexpensive starting material.

Process for producing 3,3,3-trifluoropropionic acid

There is provided a process for producing 3,3,3-trifluoropropionyl chloride, which is characterized in that 3,3,3-trifluoropropionaldehyde is chlorinated by a chlorinating agent selected from the group consisting of chlorine (Cl), sulfuryl chloride (SOCl) and organic N-chloro compounds.

Method for producing 3,3,3-trifluoropropionyl chloride

There is provided a process for producing 3,3,3-trifluoropropionaldehyde, including the step of hydrolyzing a benzyl vinyl ether of the formula [1] in the presence of a catalyst selected from the group consisting of Arrhenius acids and Lewis acids, [Chem. 17] where R represents phenyl or phenyl having a substituent Rselected from the group consisting of alkyl groups, alkoxy groups, halogen atoms, nitro groups and amino groups.

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Kasukabe, Japan

Kenji Hosoi