Tokuyama Corporation

Kenji Hirota

Katsuya Ogihara

Kanji Sakata

To prevent solidified aluminum chloride from adhering to and accumulating on a pipe and also prevent stress-corrosion cracking in the pipe, a method for producing trichlorosilane includes a cooling step of cooling a discharge gas that is discharged from a fluidized-bed reactor and that contains the trichlorosilane, the cooling step involving causing a fluid to flow through a space () inside a side wall () of a pipe (), the pipe being a pipe for discharging the discharge gas from the fluidized-bed reactor, in such a manner that the side wall () has a surface () having a temperature of not lower than 110&#xb0; C.

Production method for trichlorosilane, and pipe

An object of the present invention is to prevent stress-corrosion cracking of a header () of a reactor. A reactor for producing trichlorosilane by causing metal silicon powder and a hydrogen chloride gas to react with each other includes a cooler (), the cooler including a plurality of heat transfer medium pipes () and a header (), the plurality of heat transfer medium pipes being provided in a fluid bed () inside the reactor, the header being provided in a freeboard section () inside the reactor, the header being comprised of a corrosion-resistant material.

Reactor and production method of trichlorosilane

To provide a fluidized-bed reaction vessel and a trichlorosilane production method each of which can reduce corrosion and wear of a reaction container inner wall, a fluidized-bed reaction vessel causes metallurgical grade silicon powder and hydrogen chloride gas to react with each other for production of trichlorosilane. The fluidized-bed reaction vessel includes a plurality of ejection nozzles () standing on a distributor plate () as a bottom surface of a container body. The ejection nozzles () each have a gas ejection opening () configured to allow hydrogen chloride gas to be ejected sideways. The plurality of ejection nozzles () include a first ejection nozzle () adjacent to an outer wall () of the container body, the first ejection nozzle () having a gas ejection opening () in such a pattern as to prevent hydrogen chloride gas from being ejected toward the outer wall ().

Fluidized bed reaction container and method for producing trichlorosilane

A fluidized-bed reactor (A) includes a reaction vessel (A) configured to contain metallurgical grade silicon powder and a hydrogen chloride gas, and a portion of a side wall (w) which portion extends along at least 80% of a height extending from a gas feed opening (), which is provided in a lower part of the reaction vessel (A), to a top face of a fluid bed () has such a tapered shape that a cross section of the reaction vessel (A) which cross section is taken perpendicular to a height direction of the reaction vessel (A) increases in area in an upward direction.

Fluidized-bed-type reactor, and method for manufacturing trichlorosilane

Provided is a fluidized bed reactor () that makes it possible to stably measure a temperature distribution in the fluidized bed reactor () while no damage is caused to a temperature measuring section. Provided is a fluidized bed reactor () configured to generate trichlorosilane by reacting metallurgical grade silicon powder and hydrogen chloride gas, the fluidized bed reactor () including: a reaction vessel (); and a plurality of temperature measuring sections (), provided on an outer surface of the reaction vessel (), each for measuring a temperature inside the reaction vessel ().

Fluidized bed reactor

A process for producing trichlorosilane by reacting silicon with hydrogen chloride, which comprises bringing at least one silane compound selected from the group consisting of dichlorosilane, monochlorosilane and monosilane into contact with silicon during or prior to a reaction between silicon and hydrogen chloride to remove silicon oxide on the surface of silicon, thereby improving the reactivity of silicon with hydrogen chloride to produce silicon trichloride stably. Further, an alkali metal compound is co-present in the reaction between silicon and hydrogen chloride to suppress the production of silicon tetrachloride, thereby making it possible to produce trichlorosilane at a high selectivity.

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Yamaguchi, Japan

Kenji Hirota