Adeka Corporation

Hitachi Chemical Company, Ltd.

Janome Sewing Machine Company Limited

Canon Kabushiki Kaisha

Hitachi, Ltd.

Showa Denko Materials Co., Ltd.

Kenji Hara

Masatomi Irisawa

Seiichi Saito

Hiroshi Morita

Atsushi Kobayashi

Akira Yasuda

Yoshihiro Ishikawa

Takeshi Nishiyama

Junichi Sakano

Ryotaro Okuzono

Takeshi Shinomiya

Yoshikazu Shoji

Yuji Oda

Jinichi Omi

Toshihiko Murai

Naofumi Fujiue

Wataru Miyata

Kazuteru Nagasaka

Tomoyuki Iwashima

Hiroo Yokota

A polymerizable composition includes an amide compound represented by Formula (1) and a polymerization initiator.

Amide compound, polymerizable composition, cured material, and method of manufacturing cured material

Provided are: a water-soluble composition which has excellent storage stability and is adaptable to a wide range of light sources and capable of forming a highly fine pattern; a method of producing a cured product of the same; a cured product of the same; and an acylphosphinate. The water-soluble composition contains: an acylphosphinate (A) represented by Formula (I) below, wherein Xrepresents an aryl group having 6 to 15 carbon atoms; Xrepresents a linear alkyl group having 1 to 8 carbon atoms or the like; Arepresents an alkali metal ion or the like; and m represents a number of 1 to 3; and a compound (B) having a group represented by Formula (II) below, wherein Rrepresents a hydrogen atom or the like; Zrepresents an oxygen atom or the like; Rrepresents a hydrogen atom or the like; Zrepresents an alkylene group having 1 to 6 carbon atoms; n represents a number of 0 to 30; * means a bond; and, when the compound (B) has plural groups represented by Formula (II), plural Rs, Zs, Zs and n's are each optionally the same or different. 

Water-soluble composition, production method for cured product thereof, and cured product thereof, and acyl phosphinate

Provided are: a radical polymerization initiator which has excellent sensitivity and solubility in water; a composition containing the same; a cured product of the composition; a method of producing the cured product; and a compound. The radical polymerization initiator contains a compound represented by Formula (A) below (wherein Zrepresents a direct bond or the like; Zrepresents &#x2014;C(R)&#x2014; or the like; Rto Reach represent a hydrogen atom or the like, or a group containing a salt-forming group, which is represented by Formula (B1) below (wherein Lrepresents a direct bond or the like, B represents an acidic group salt or the like, b represents 1 to 10, and the asterisk (*) represents a binding site), at least one of Rto Ris the group containing a salt-forming group; Rand the like each represent a hydrogen atom or the like; one or more hydrogen atoms in the alkyl group and the like used as Rto Rand the like are optionally substituted with an ethylenically unsaturated group or the like; one or more methylene groups in Rto Rand the like are optionally substituted with a double bond or the like; adjacent groups such as Rand Rare optionally bound together to, form a ring and optionally form a fused ring with a benzene ring in Formula (A); and represents a hydrogen atom or the like). 

Radical polymerization initiator, composition containing same, cured product of composition, production method for cured product, and compound

Provided are: a curable composition having excellent photolithographic properties and resin elution properties; a cured product of the curable composition; and a curing method of the curable composition. The curable composition is characterized by including: (A) at least one selected from the group consisting of a water-soluble polyfunctional (meth)acrylates and water-soluble polyfunctional (meth)acrylamides; and (B) a photosensitive group-containing water-soluble polymer. The water-soluble polyfunctional (meth)acrylates are preferably compounds represented by Formula (I) below, and the water-soluble polyfunctional (meth)acrylamides are preferably compounds represented by Formula (II) below. In Formulae (I) and (II), Rrepresents a hydrogen atom, a methyl group, or a halogen atom; Xrepresents an alkylene group having 1 to 6 carbon atoms that is optionally substituted with a hydroxy group; A represents an n-valent organic group; Rrepresents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; m represents a number of 1 to 30; n represents a number of 2 to 12; and t represents a number of 2 to 12. 

Curable composition, cured product thereof, and curing method therefor

An embroidery data generating apparatus includes: a coordinate position registration unit that registers coordinate positions of multiple track points detected at predetermined intervals from a track of a continuous line input via a screen, with them associated with a track point input order; a reference distance registration unit that registers a stitching pitch length as a reference distance; and an embroidery data generating unit configured to generate a desired track point on the continuous line as a needle location start point, to select particular track points that are subsequently input from among the multiple track points as reference track points, to convert the coordinate positions of the reference track points to arrange them in input order from the needle location start point at intervals of the reference distance, to generate the converted points as needle location points, and to generate data of the generated needle location points as embroidery data.

Embroidery data generating apparatus, embroidery data generating method, and program for embroidery data generating apparatus

Provided are: a pattern-forming method by which a laminate that has excellent interlayer adhesion of a resist film, yields a high-definition pattern and exhibits excellent gas barrier properties and high solvent resistance is obtained; and an electronic device produced by the same. The pattern-forming method includes: the step (1) of forming a film using a composition on a support; the exposure step (2) of irradiating a prescribed part of the thus formed film with an active energy ray to modify the developability of the prescribed part; and the development step (3) of developing the film to obtain a pattern, wherein, a plurality of compositions that differ in solubility to a developing solution are used as the composition, and the resulting pattern has a multilayer structure.

Pattern formation method and electronic device manufactured using same

An object is to provide a lithium ion battery excellent in input/output characteristics, cycle life characteristics, and safety. The lithium ion battery is a lithium ion battery including, in a battery container, an electrolyte solution and an electrode group in which a positive electrode and a negative electrode are disposed through a separator. A lithium-nickel-manganese-cobalt composite oxide having a layered crystal structure is contained as a positive electrode active material, an easily graphitizable carbon is contained as a negative electrode active material, a weight of the easily graphitizable carbon heated at 550&#xb0; C. in dry air flow in thermogravimetric analysis is equal to more than 75% of a weight of the easily graphitizable carbon heated at 25&#xb0; C. therein, and a weight of the easily graphitizable carbon heated at 650&#xb0; C. therein is equal to or less than 20% of the weight of the easily graphitizable carbon heated at 25&#xb0; C. therein.

Lithium ion battery, negative electrode for lithium ion battery, battery module automobile, and power storage device

Disclosed is a photocurable resin composition that is alkali-developable, provides a cured product having excellent adhesiveness and scratch resistance, and is useful as a hard-coat material for an image display surface of an image display device. Also disclosed is a novel siloxane compound that is useful as a resin component of the aforementioned photocurable resin composition. Specifically, the invention provides: a photocurable resin composition including (A) a polyol acrylate compound, (B) a compound including, in the molecule thereof, an acrylic or methacrylic group and a carboxyl group, (C) a siloxane compound represented by one of the general formulae (1) to (4), and (D) a photoradical generating agent; and a novel siloxane compound represented by the general formula (4). The specific contents of the general formulae (1) to (4) are as described in the Description.

Photocurable resin composition and novel siloxane compound

The present invention provides a coating liquid for forming an insulation film, which has a small shrinkage in the calcination step in water vapor and is not likely to cause cracking of a resulting silica coating film or detachment thereof from a semiconductor substrate; an insulation film using the same; and a method of producing a compound used in the same. The coating liquid of comprises an inorganic polysilazane whose ratio of a peak area at 4.5 to 5.3 ppm attributed to SiHgroup and SiHgroup with respect to a peak area at 4.3 to 4.5 ppm attributed to SiHgroup inH-NMR spectrum is 4.2 to 50; and an organic solvent. The insulation film is obtained using the coating liquid.

Coating liquid for forming insulation film, insulation film using the same, and method for producing compound used in the same

A curable composition for an optical material including a specific silicon-containing polymer (A), a specific epoxy resin (B) and an energy ray-sensitive cationic polymerization initiator (C) as essential components.

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Tokyo, Japan

Kenji Hara