Canon Kabushiki Kaisha

Kenichiro Shinoda

Kenichiro Mori

An exposure apparatus includes an illumination optical system for illuminating an reticle using light from a light source, a projection optical system for projecting a pattern of the reticle onto a substrate, and a variable stop having an opening for regulating an illumination area on the substrate, said variable stop is arranged near a position conjugate with the substrate, wherein a position of the variable stop is variable along an optical axis of the illumination optical system or an optical axis of the projection optical system.

Exposure apparatus

An exposure apparatus includes a projection optical system for exposing and transferring a pattern on a mask onto an object, an illumination optical system for forming a secondary light source surface approximately conjugate with a pupil in the projection optical system, and for illuminating the mask, and a mechanism for making non-uniform at least one of a transmittance distribution from the secondary light source to the object and a light intensity distribution on the secondary light source surface.

Exposure apparatus and method, and device fabricating method using the same

An illumination optical system for illuminating a reticle using light from a light source includes an illumination-light generating mechanism for generating a light amount distribution on a plane that has a substantially Fourier conversion relationship with the reticle while making variable a ratio of a light amount between a first area and a second area different from the first area, the first and second areas being on the plane.

Illumination optical system, exposure apparatus having the same, and device fabricating method

An illumination apparatus for using a beam emitted from a light source to illuminate an object area includes a condensing optical system for condensing the beam emitted from the light source, and a reflection type optical integrator located between the condensing optical system and the object area, the optical integrator having an m-gonal (where m is an even number) sectional shape, forming multiple pairs of opposing reflection surfaces, and reflecting the beam between the multiple pairs of opposing reflection surfaces, wherein a length L in an axial direction of the reflection type optical integrator meets the following equations: R=&#x3a6;/[tan {sin(sin &#x3b8;/n)}]; and C&#xd7;(A&#x2212;0.1)&#xd7;R&#x2266;L&#x2266;C&#xd7;(A+0.1) X R, where n is a refractive index of a medium between the reflection surfaces, &#x3a6; is a distance between the reflection surfaces, &#x3b8; is an angle of divergence when the beam emitted from the condensing optical system enters the reflection type optical integrator, C is a constant determined in relation to the sectional shape of the reflection type optical integrator, and A is a natural number.

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Tochigi, Japan

Kenichiro Shinoda