Tokyo Ohka Kogyo Co., Ltd.

Tokyo Institute of Technology

Kenichiro Miyashita

Ken Miyagi

Daiju Shiono

Tasuku Matsumiya

Takahiro Senzaki

Tsuyoshi Kurosawa

Katsumi Ohmori

Yoshiyuki Utsumi

Akiya Kawaue

Yoshitaka Komuro

Takehiro Seshimo

Teruaki Hayakawa

An undercoat agent including a block copolymer having a plurality of blocks bonded formed on a substrate. The undercoat agent contains a resin component that includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer. The method includes applying an undercoat agent to a substrate to form a layer containing the undercoat agent; forming a layer containing a block copolymer having multiple blocks bonded on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and selectively removing a phase containing at least one block of multiple blocks constituting the block copolymer.

Undercoat agent and method of forming pattern of layer containing block copolymer

The present invention relates to a composition including: a component (A) being a block copolymer including a block Pbonded to one, or two or more blocks incompatible with the block Pand whose etching selectivity to the block Pis greater than one; and a component (B) being at least one polymer selected from the group consisting of a random copolymer and a homopolymer, wherein the polymer of the component (B) is compatible with at least one block other than the block Pwithin the blocks constituting the block copolymer of the component (A), and is incompatible with the block P.

Block copolymer-containing composition and method of reducing pattern

A method of producing a structure containing a phase-separated structure, including applying a neutralization film to a substrate to form a layer of a neutralization film; applying a block copolymer having a plurality of polymers bonded thereto, and a weight average molecular weight of 150,000 or more to the layer of the neutralization film, so as to form a layer containing the block copolymer and having a coating film thickness of 23 nm or less; and phase-separating the layer containing the block copolymer.

Method of producing structure containing phase-separated structure, phase separated structure, and block copolymer composition

A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing.

Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material

A undercoat agent used for performing phase separation of a layer formed on a substrate and containing a block copolymer having a plurality of blocks bonded, wherein the undercoat agent contains a resin component, the resin component is formed from a structural unit having an aromatic ring and a structural unit not having an aromatic ring, and the resin component has a group that can interact with the substrate, and also has a 3 to 7-membered, ether-containing cyclic group.

Undercoat agent, and pattern formation method for layer containing block copolymer

A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety. 

Resist composition, method of forming resist pattern, novel compound and acid generator

A resist composition including: a base component (A) which exhibits changed solubility in a developing solution under action of acid; a nitrogen-containing organic compound component (C) containing a compound (C1) represented by general formula (c1) shown below; and an acid generator component (B) which generates acid upon exposure, provided that the compound (C1) is excluded from the acid generator component (B): wherein Rrepresents a nitrogen-containing heterocyclic group which may have a substituent; Xrepresents a linear or branched divalent aliphatic hydrocarbon group of 1 to 10 carbon atoms, a cyclic divalent aliphatic hydrocarbon group of 3 to 20 carbon atoms or a divalent aliphatic hydrocarbon group of 3 to 20 carbon having a cyclic partial structure, or any one of these groups in which some or all of the hydrogen atoms thereof have been substituted with fluorine atoms; and Mrepresents an organic cation.

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Kawasaki, Japan

Kenichiro Miyashita