Canon Kabushiki Kaisha

Hitachi, Ltd.

Renesas Technology Corp.

Tokyo Institute of Technology

Yokogawa Electric Corporation

Other

Ricoh Company, Ltd.

Hitachi High-tech Corporation

Renesas Electronics Corporation

Kyoto University

Hitachi-high-technologies Corporation

Subaru Corporation

National Institute of Advanced Industrial Science and Technology

University of Yamanashi

Tokyo University of Science Educational Foundation Administrative Organization

Kenichi Takeda

Toshihiro Ifuku

Tetsuro Fukui

Katsumi Aoki

Hiroshi Funakubo

Takanori Matsuda

Tatsuo Furuta

Noriyuki Sakuma

Makoto Kubota

Naofumi Ohashi

Junji Noguchi

Nobuo Owada

Tatsuyuki Saito

Jumpei Hayashi

Koji Suzuki

Yoshio Homma

Seiichi Kondo

Toshinori Imai

Shinya Koyama

Toshiyuki Mine

Yuji Sakemi

Hiroshi Fukuda

Nobuhiko Sato

Yasushi Shimizu

Masato Takahashi

Naoki Yamamoto

Takayuki Watanabe

Hidenori Tanaka

Kunio Harada

Hizuru Yamaguchi

Kazuhisa Kemmochi

Daisuke Ryuzaki

Takehito Okabe

Koichi Sato

Takashi Hasegawa

Tsuyoshi Ishikawa

Hiroshi Saito

Katsumi Kurematsu

Satoshi Wada

Atsushi Takeda

Daisuke Kodama

Hideaki Takahashi

Shinichiro Kimura

Toshio Honma

Hiroshi Miki

Itaru Yanagi

Kenji Hinode

Rena Akahori

Mayu Aoki

Tsuyoshi Fujiwara

Naoyuki Fujimoto

Masato Yamaji

Shintaro Yokoyama

Kazuyuki Hozawa

Hiroshi Aoto

Akira Uebayashi

Kaoru Miura

Shogo Hyakutake

Hiromi Shimamoto

Yutaka Nakamura

Kazuma Matsui

Satoru Fukushima

Masaki Azuma

Koji Dan

Minoru Midorikawa

Kiyotaka Wasa

Kenichi Akashi

Yuuki Inoue

Masaki Shioya

Fujio Takahashi

Risako Ueno

Yukio Nagase

Miki Ueda

Nozomi Sawada

Isami Itoh

Naoshi Itabashi

Masahiro Itoh

Yusuke Goto

Nobuyuki Itoh

Kimiyoshi Hayashi

Yoshimitsu Yanagawa

Satoshi Fujita

Kazuhiko Hirooka

Nobuhiro Kumada

Masao Nakano

Tatsuya Tada

Mikio Shimada

Takashi Iijima

Satoru Hirakata

Yoshitaka Nakamura

Makoto Miura

Kazuo Kagiura

Satoshi Okamoto

Yuko Hanaoka

Soichiro Okamura

Masaki Ohtani

Yota Furukawa

Hitoshi Arai

Yuichi Shimakawa

A method includes a step of introducing a solution between a substrate with a membrane in which the membrane is provided so as to close an opening and a substrate provided with an independent electrode in which the independent electrode is provided, a step of pressure bonding the substrate with the membrane and the substrate with the independent electrode through a partition wall, and a step of forming a sealed liquid tank surrounded by at least the membrane and the partition wall by the pressure bonding, and arraying of a solid-state type nanopore sequencer is simply performed.

Liquid tank formation method, measurement device, and analysis device

A first modulation voltage is applied to a thin film. An amount of a change in the phase of a current carried through the thin film with respect to the phase of the first modulation voltage is compared with a threshold. Upon detecting that the amount of the change in the phase exceeds the threshold is detected, the application of the first modulation voltage is stopped. Thus, a nanopore is formed on the thin film at high speed.

Nanopore-forming method, nanopore-forming device and biomolecule measurement device

A biological sample analysis chip including a first substrate, a membrane disposed on the first substrate, a first liquid tank which is provided with a first electrode, a plurality of second liquid tanks each of which is provided with at least one flow path and a second electrode; and a second substrate disposed below the first substrate, in which the plurality of second liquid tanks are substantially insulated from each other, the membrane disposed on the first substrate is disposed between the first liquid tank and the plurality of second liquid tanks so as to form a portion of the first liquid tank and a portion of the plurality of second liquid tanks, and the second substrate is provided with the at least one flow path and the second electrode so as to form a portion of the plurality of second liquid tanks.

Biological sample analysis chip, biological sample analyzer and biological sample analysis method

A pore forming method in which a pore is formed in such a way that a first voltage is applied between electrodes that are disposed with a film in an electrolytic solution therebetween; a second voltage, which is lower than the first voltage, is applied between the electrodes; a current that flows between the electrodes owing to the application of the second voltage is measured; it is judged whether a value of a current is equal to or larger than a predefined threshold; and if the value of the current is smaller than the threshold, the above sequence is repeated until a pore is formed. In this case, the second voltage is a voltage that makes the value (I) of the current flowing through the film practically 0. With the use of the above method, a nanopore is formed in the film simply, easily, and accurately.

Hole forming method, measuring apparatus and chip set

Provided is a method of manufacturing an oscillator, including: arranging an electrode on a piezoelectric ceramics free from being subjected to polarization treatment, to thereby provide a piezoelectric element; bonding the piezoelectric element and a diaphragm to each other at a temperature T; bonding the piezoelectric element and a power supply member to each other at a temperature T; and subjecting the piezoelectric ceramics to polarization treatment at a temperature T, in which the temperature T, the temperature T, and the temperature Tsatisfy a relationship T&#x3e;Tand a relationship T&#x3e;T

Method of manufacturing an oscillator

While an insulating film having a near-field light generating element placed thereon is being irradiated with light in an electrolytic solution, or after the film that has been irradiated with light is disposed in the electrolytic solution, a first voltage is applied between the two electrodes installed in the electrolytic solution across the film, a second voltage is then applied between the two electrodes, and a value of a current that flows between the two electrodes due to the application of the second voltage is detected. This procedure is stopped when the current value reaches or exceeds a pre-set threshold value, whereby a hole is formed at a desired location in the thin-film.

Hole formation method and measurement device

To introduce a biomolecule into a nanopore without the need to check the position of the nanopore in a thin film. In addition, displacement stability is ensured and stable acquisition of blocking signals is realized. An immobilization memberhaving a larger size than a thin filmwith a nanoporeis used, and biomolecules are immobilized on the biomolecule immobilization memberat a density that allows at least one biomoleculeto enter an electric field region around the nanopore when the biomolecule immobilization memberhas moved close to a nanopore device

Biomolecule measurement system and biomolecule measurement method

An apparatus for a thin film device is used for analyzing a biopolymer. The apparatus has a thin film, a first solution in contact with a first surface of the thin film, a second solution in contact with a second surface of the thin film, a flow path or a conductive wire for adjusting the potential difference between the first solution and the second solution to a small value, a control unit for controlling the flow path or the conductive wire, an inlet from which a biopolymer is introduced to at least one of the first and second solution, a first electrode provided in the first solution, a second electrode provided in the second solution and an ammeter for measuring the current which flows between the first and second electrode when the biopolymer passes through a hole in the thin film between the first and second solution.

Biopolymer analysis device and biopolymer analysis method

A method for producing a membrane device includes: forming an insulating film as a first film on a Si substrate; forming a Si film as a second film on the entire surface or a part of the first film; forming an insulating film as a third film on the second film; forming an aperture so as to pass through a part of the third film positioned on the second film and not to pass through the second film; etching a part of the substrate on one side of the first film with a solution that does not etch the first film; and etching a part or all of the second film on the other side of the first film with a gas or a solution that does not etch the first film and has an etching rate for the third film lower than an etching rate for the second film.

Membrane device and method for manufacturing same

A biomolecule measuring device includes a first liquid tank and a second liquid tank which are filled with an electrolytic solution, a nanopore device that supports a thin film having a nanopore and is provided between the first liquid tank and the second liquid tank so as to communicate between the first liquid, tank and the second liquid tank through the nanopores, and an immobilizing member that is disposed in the first liquid tank, has a size larger than that of the thin film, and to which the biomolecules are immobilized, in which at least, one of the nanopore device and the immobilizing member has a groove structure.

Biomolecule measurement apparatus

A vehicle-body front structure includes a pair of left and right side frames, a cross member, a pair of sub-frames, projections, and buckling structures. The pair of left and right side frames extend in a front-rear direction. The cross member is coupled to a lower side of the pair of left and right side frames and extends in a left-right direction. The pair of sub-frames are coupled to a lower side of the cross member and extend in the front-rear direction. Each projection is disposed on a front end side of the corresponding sub-frame and projects from the corresponding side frame outward in the left-right direction in a plan view. Each buckling structure is formed in the corresponding sub-frame and causes the sub-frame to buckle such that the corresponding projection comes into contact with the cross member when an impact load is applied to the projection from a front side.

Vehicle-body front structure

A lead-free piezoelectric element that stably operates in a wide operating temperature range contains a lead-free piezoelectric material. The piezoelectric element includes a first electrode, a second electrode, and a piezoelectric material that includes a perovskite-type metal oxide represented by (BaCa)(TiZr)O(1.00&#x2264;a&#x2264;1.01, 0.02&#x2264;x&#x2264;0.30, 0.020&#x2264;y&#x2264;0.095, and y&#x2264;x) as a main component and manganese incorporated in the perovskite-type metal oxide. The manganese content relative to 100 parts by weight of the perovskite-type metal oxide is 0.02 parts by weight or more and 0.40 parts by weight or less on a metal basis.

Piezoelectric element, multilayered piezoelectric element, liquid discharge head, liquid discharge apparatus, ultrasonic motor, optical apparatus, and electronic apparatus

A method of manufacturing a membrane device comprises: a first step of forming a pillar structure on a part of a Si substrate by etching; a second step of forming a first insulation layer on the Si substrate so as to expose a Si surface of an upper part of the pillar structure; a third step of forming a second insulation layer on the pillar structure and the first insulation layer; and a fourth step of etching the Si substrate from an opposite side of the second insulation layer and etching the pillar structure with the first insulation layer being a mask, to thereby form a membrane, which is a region free of the pillar structure in the second insulation layer.

Method of manufacturing membrane device, membrane device, and nanopore device

The membrane of a conventional solid-state nanopore device, which is believed to be promising for understanding the structural characteristics of DNA and determining a nucleotide sequence, has been thick, and the accuracy in determining a nucleotide sequence in the DNA chain has been insufficient. A method characterized by forming a membrane by forming a first film on a first substrate having a surface of Si, then forming a hole in the first film in such a manner that the surface of the first substrate is exposed, then forming a second film on the first film and on the surface of the first substrate and then etching the first substrate with a solution which does not remove the second film.

Device and method for forming same

Growing community of inventors

Yokohama, Japan

Kenichi Takeda