Nissan Chemical Industries Limited

Kenichi Motoyama

Hiroyoshi Fukuro

Hitoshi Furusho

Takakazu Nakada

Yoshihiro Tani

Makoto Wakabayashi

Satoru Numajiri

Rie Gunji

To provide a highly hard coating film formed on a substrate, as adhered to the surface of the substrate and having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90&#xb0; to 115&#xb0;. A coating film having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90&#xb0; to 115&#xb0;, which is formed as adhered to a substrate surface by forming a reaction mixture comprising a silicon compound (A) of the formula Si(OR), a silicon compound (B) of the formula CF(CF)CHCHSi(OR), a silicon compound (C) of the formula HNCOH(CH)Si(OR), an alcohol (D) of the formula RCHOH and oxalic acid (E), in a specific ratio, heating this reaction mixture at a temperature of from 40 to 180&#xb0; C. in the absence of water to form a solution of a polysiloxane, then applying a coating fluid comprising the polysiloxane solution on a substrate surface to form a coating, and heat-curing the coating at a temperature of from 40 to 450&#xb0; C.; a process for forming such a coating film, and a process for producing such a coating fluid.

Coating film having low refractive index and water repellency

A composite thin film-holding substrate for a surface light emitter, which is a transparent substrate including a composite thin film containing fine particles and a binder formed on the surface of a transparent base material. The refractive index of the composite thin film is higher than the refractive index of the transparent base material. The difference in the refractive index between the fine particles and the binder contained in the composite thin film is at least 0.1, and the ratio of (solid content mass of the fine particles)/(solid content mass of the binder+solid content mass of the fine particles) of the composite thin film is from 0.01 to 0.5. A surface light emitter can use the substrate.

Planar luminous body with improved light-extraction efficiency

To provide a coating fluid for forming a film, which is curable sufficiently by heat treatment at a low temperature of at most 70&#xb0; C. to form a cured film excellent in abrasion resistance and which is excellent in storage stability, a film obtained from the coating fluid for forming a film, and a process for forming the film. A coating fluid for forming a film, which comprises a polysiloxane (A) obtained by condensation polymerization of a silicon compound of the formula (1) as the essential component, and a compound (B) of the formula (2):Si(OR)&#x2003;&#x2003;(1)wherein Ris a Chydrocarbon group, each of R, R, Rand Rwhich are independent of one another, is a hydrogen atom or a Corganic group.

Coating fluid for forming film, and film thereof and film-forming process

A silica-based coating film on a substrate surface is prepared by forming a reaction mixture comprising a tetraalkoxysilicon compound (A) and/or an alkyl/alkoxy silane compound (B), an alcohol (C), and oxalic acid (D), in such ratios that the amount of alcohol (C) ranges from 0.5 to 100 mols per mol of all alkoxy groups present in the silicon compounds (A) and (B), and the amount of oxalic acid (D) ranges from 0.2 to 2 mols per mol of all alkoxy groups in the silicon compounds (A) and (B), and while maintaining the mixture at a SiOconcentration ranging from 0.5 to 11%, as calculated from silicon atoms in the mixture, by means of the alcohol (C); heating the reaction mixture at a temperature ranging from 50 to 180&#xb0; C. until the total remaining amount of the silicon compounds (A) and (B) in the reaction mixture is not more than 5 mol %, to form a solution of a polysiloxane having a number average molecular weight, calculated on the basis of a polystyrene standard, ranging from 2,000 to 15,000; applying a coating fluid containing the solution of the polysiloxane onto a substrate surface; and thermally curing a coating film obtained by the application, at a temperature ranging from 80 to 600&#xb0; C.

Method of forming thick silica-based film

The present invention provides a process for forming a silica-based coating film, characterized by heating a reaction mixture comprising a silicon compound (A) represented by Si (OR)and/or a silicon compound (B) represented by RSi (OR)(wherein n is an integer of from 1 to 3), an alcohol (C) represented by RCHOH and oxalic acid (D) in specific ratios, at a temperature of from 50 to 180&#xb0; C. in the absence of water, to form a solution of a polysiloxane having a number average molecular weight, as calculated as polystyrene, of from 2,000 to 15,000, applying a coating fluid containing such a solution on a substrate surface, and thermally curing a coating film obtained by such coating, at a temperature of from 80 to 600&#xb0; C., and such a coating film having a film thickness of from 0.5 to 5 &#x3bc;m, a coating fluid to be used for such a coating film, and a process for producing such a coating fluid.

The present invention relates to an antireflection film effective for improving the transparency of an image display device such as a liquid crystal display (LCD), a plasma display (PDP), CRT, EL or a touch panel, to an optical product made of glass, such as a lens for eye glasses, and to an antireflection glass. The present invention is also directed to a process of coating a glass surface with a mixture comprising particular silicon compounds and thermosetting the coating film at a temperature ranging from 480 to 520&deg; C. This process can be used to form an antireflection film on a glass surface having a refractive index ranging from 1.33 to 1.38 and a contact angle of water of at most 40 degrees.

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Funabashi, Japan

Kenichi Motoyama