Fujibo Holdings, Inc.

Kenichi Koike

Hiroshi Kashiwada

Shin Tokushige

Keisuke Nakase

Hiroshi Kurihara

Tatsuya Yamada

Yousuke Narada

A polishing pad comprising a knitted fabric constituted by warp knitting or weft knitting, and a resin with which the knitted fabric is impregnated, and having a cross section cut in a surface direction of the knitted fabric, as a polishing surface.

Polishing pad and method for producing the same, and method for producing polished product

A lapping material having a knitted fabric constituted by warp knitting or weft knitting, and a resin with which the knitted fabric is impregnated.

Lapping material and method for producing the same, and method for producing polished product

A polishing pad comprising a resin-containing polishing cloth having a polishing cloth base impregnated with a polyurethane resin and silicon carbide, wherein the silicon carbide has a particle diameter in a range from 0.2 to 3.0 &#x3bc;m, and the content of the silicon carbide in the resin-containing polishing cloth is in a range from 60 to 500 parts by mass relative to 100 parts by mass of the polishing cloth base.

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Saijo, Japan

Kenichi Koike