Hitachi-high-technologies Corporation

Hitachi-science Systems, Ltd.

Hitachi, Ltd.

Hitachi Instrument Engineering Co., Ltd.

Kenichi Hirane

Yoshihiko Nakayama

Masashi Kimura

Yoichi Ose

Takashi Ohshima

Hiroyuki Itoh

Tomohisa Ohtaki

Shin Imamura

Ryoichi Ishii

Haruhisa Takahata

An electron microscope is provided with a scintillator () and a light guide (). The scintillator () has an index of refraction greater than the index of refraction of the light guide (), and an end surface () joined to the light guide () is formed from a curved surface with a convex shape on the outside. The scintillator () is formed by a Y&#x2014;Al&#x2014;O based ceramic sintered body represented by the compositional formula (LnCe)MO(wherein Ln represents at least one element selected from the group consisting of Y, Gd, La, and Lu, and M represents either or both of Al and Ga).

Electron microscope and electron beam detector

In an environmental scanning electron microscope in which differential pumping for maintaining the pressure ratio between an electron optical system and a specimen chamber at a predetermined value is effected and a probe electric current is conditioned to meet a predetermined or more value so as to permit observation of uncooked food and moist specimens in low vacuum, there are provided three stages of objective apertures used as apertures for an objective lens for an electron beam in the electron optical system and used also as orifices for differential pumping for maintaining the pressure ratio between the electron optical system and the specimen chamber at a predetermined value. Then, a deflection fulcrum of the electron beam in the electron optical system is set at a mid stage of the three-stage objective aperture.

Environmental scanning electron microcope

Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion. With such an arrangement, it is possible to prevent high-voltage discharge due to an increase in water content of the gap portion and also instability of an electron beam due to a leakage current.

Electron beam apparatus and high-voltage discharge prevention method

An electron beam lithography apparatus comprising an electron lens, a deflector, a reflective electron detector of marks on a stage or a specimen thereon when the deflector scans the marks, and a means for memorizing high order polynomial equations and calculating a correcting value of the deflector controlling means based on the high order polynomial equations, wherein all coefficients of the high order polynomial equation are calculated when the electron beam lithography apparatus starts up, and after then, coefficient of the first order term is calculated from the position signals of the marks frequently in a short cycle.

Electron beam lithography apparatus

Growing community of inventors

Hitachi, Japan

Kenichi Hirane