Sii Nanotechnology Inc.

Kenichi Akamatsu

Hiroto Muto

Shigeru Wakiyama

Compound charged particle beam device

Provided are a structure of an apparatus for analysis, inspection, and measurement in which a support structure supporting a detection unit is resistant to disturbance, suppresses a reduction in resolution during large-sample measurement, and has high rigidity, and a probe microscope using the apparatus structure. The apparatus structure supporting the detection unit which is opposed to a sample which is located on a unit movable in at least one axis direction and is an object to be analyzed has an arch shape. In the apparatus structure having the arch shape and supporting the detection unit, a surface substantially perpendicular to a flat surface portion of a sample holder located immediately under the apparatus structure is formed. The detection unit is supported on the perpendicular surface. The arch-shaped apparatus structure is a curved structure consistent with a catenary curve.

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Chiba, Japan

Kenichi Akamatsu