Jsr Corporation

Kengo Ehara

Hiroki Nakagawa

Goji Wakamatsu

Naoya Nosaka

Tsubasa Abe

Hiroki Nakatsu

Ichihiro Miura

A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): Rand Reach independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of Rand Rrepresents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or Rand Rtaken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which Rand Rbond. 

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Kengo Ehara