Taiwan Semiconductor Manufacturing Comp. Ltd.

Keng-Yu Chen

Chung-Long Chang

Tsung-Yu Yang

Kuan-Chi Tsai

Wei-Kung Tsai

Kuo-Yu Cheng

Chun-Hung Chen

Chih-Ping Chao

Yong-En Syu

Yu-Lung Yeh

Shih-Shiung Chen

Alex Kalnitsky

Yung-Chih Tsai

Shao-Yu Chen

Embodiments for forming a semiconductor device structure are provided. The semiconductor device structure includes a substrate and a buried oxide layer formed over the substrate. An interface layer is formed between the substrate and the buried oxide layer. The semiconductor device structure also includes a silicon layer formed over the buried oxide layer; and a polysilicon layer formed over the substrate and in a deep trench. The polysilicon layer extends through the silicon layer, the buried oxide layer and the interface layer.

Semiconductor device and method for forming the same

The present disclosure relates to a semiconductor substrate including, a first silicon layer comprising an upper surface with protrusions extending vertically with respect to the upper surface. An isolation layer is arranged over the upper surface meeting the first silicon layer at an interface, and a second silicon layer is arranged over the isolation layer. A method of manufacturing the semiconductor substrate is also provided.

Substrate fabrication method to improve RF (radio frequency) device performance

A method for forming a radio frequency area of an integrated circuit are provided. The method includes forming a buried oxide layer over a substrate, and an interface layer is formed between the substrate and the buried oxide layer. The method also includes etching through the buried oxide layer and the interface layer to form a deep trench, and a bottom surface of the deep trench is level with a bottom surface of the interface layer. The method further includes forming an implant region directly below the deep trench and forming an interlayer dielectric layer in the deep trench.

Mechanisms for forming radio frequency (RF) area of integrated circuit structure

The present disclosure relates to a silicon-on-insulator (SOI) substrate having a trap-rich layer, with crystal defects, which is disposed within a handle wafer, and an associated method of formation. In some embodiments, the SOI substrate has a handle wafer. A trap-rich layer, having a plurality of crystal defects that act to trap carriers, is disposed within the handle wafer at a position abutting a top surface of the handle wafer. An insulating layer is disposed onto the handle wafer. The insulating layer has a first side abutting the top surface of the handle wafer and an opposing second side abutting a thin layer of active silicon. By forming the trap-rich layer within the handle wafer, fabrication costs associated with depositing a trap-rich material (e.g., polysilicon) onto a handle wafer are reduced and thermal instability issues are prevented.

Handle wafer for high resistivity trap-rich SOI

Embodiments of mechanisms of forming a radio frequency area of an integrated circuit are provided. The radio frequency area of an integrated circuit structure includes a substrate, a buried oxide layer formed over the substrate, and an interface layer formed between the substrate and the buried oxide layer. The radio frequency area of an integrated circuit structure also includes a silicon layer formed over the buried oxide layer and an interlayer dielectric layer formed in a deep trench. The radio frequency area of an integrated circuit structure further includes the interlayer dielectric layer extending through the silicon layer, the buried oxide layer and the interface layer. The radio frequency area of an integrated circuit structure includes an implant region formed below the interlayer dielectric layer in the deep trench and a polysilicon layer formed below the implant region.

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Tainan, Taiwan

Keng-Yu Chen