Canon Kabushiki Kaisha

Ken Yamaguchi

Hidemasa Mizutani

Masaru Nakayama

Yasuteru Ichida

Jun Nakayama

Kazuhiko Muto

Disclosed is a photo sensor in which a photoelectric converter having a P-N junction and an amplifying section having a bipolar transistor to amplify an output of this converter are integrally formed in a semiconductor substrate. The input stage of the amplifying section has an insulating gate type transistor, and the output of the photoelectric converter is inputted to the gate electrode of this transistor. The photosensing surface of the photoelectric converter is covered by a transparent ptotection film, and a thickness of this film is determined so as to make the reflection factor of the incident light at the photo sensing surface of the photoelectirc converter zero. In manufacturing of this photo sensor, the base region of the bipolar transistor and one region of the P-N junction of the photoelectric converter of the same conductivity type as the base region are simultaneously formed.

Method for manufacturing a photosensor

There is a photosensor in which a photoelectric converter having a P-N junction and an amplifying section having a bipolar transistor to amplify an output of this converter are integrally formed in a semiconductor substrate. The input stage of the amplifying section has an insulating gate type transistor, and the output of the photoelectric converter is inputted to the gate electrode of this transistor. The photosensing surface of the photoelectric converter is covered by a transparent protection film, and a thickness of this film is determined so as to make the reflection factor of the incident light at the photosensing surface of the photoelectric converter zero. In the manufacturing of this photosensor, the base region of the bipolar transistor and one region of the P-N junction of the photoelectric converter of the same conductivity type as the base region are simultaneously formed.

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Atsugi, Japan

Ken Yamaguchi