Tokyo Ohka Kogyo Co., Ltd.

Riken Corporation

The University of Chicago

Tokyo Institute of Technology

Hokkaido University

Tokyo Ohka Kogyo., Ltd.

Ken Miyagi

Tasuku Matsumiya

Takahiro Dazai

Takahiro Senzaki

Tsuyoshi Kurosawa

Hitoshi Yamano

Toshimasa Nakayama

Hidekatsu Kohara

Takehiro Seshimo

Daiju Shiono

Kousuke Doi

Takaya Maehashi

Shigenori Fujikawa

Katsumi Ohmori

Kenichiro Miyashita

Akiya Kawaue

Harumi Hayakawa

Yoshiyuki Utsumi

Paul Franklin Nealey

Taku Hirayama

Satoshi Niikura

Satoshi Shimatani

Mari Koizumi

Xuanxuan Chen

Atsuko Hirata

Koichi Misumi

Yoshihiro Inao

Atsushi Miyanari

Masahito Yahagi

Teruaki Hayakawa

Toshifumi Satoh

Takuya Isono

Ryuusaku Takahashi

Kenji Maruyama

Kazuyuki Nitta

Takayoshi Mori

Masaki Kurihara

Daisuke Kawana

Mitsuo Hagihara

Masahiro Masujima

Akira Katano

Toshiaki Tachi

Yasuhide Ohuchi

Lei Dong

Toshihiro Yamaguchi

Kosuke Doi

Shunma Tanaka

A resin composition for forming a phase-separated structure includes a block copolymer having a block (b1) formed of a repeating structure of styrene units, the block (b1) being partially substituted with a constituent unit represented by the following General Formula (c1) and a block (b2) having a repeating structure of methyl methacrylate units. In the formula, R is a hydrogen atom or a methyl group and Ris a hydrophobic functional group

Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer

A resin composition for forming a phase-separated structure containing a block copolymer having a first block and a second block, in which the first block is formed of a constituent unit represented by Formula (b1), the second block is formed of a constituent unit represented by Formula (b2m) and a random copolymer having a constituent unit represented by Formula (b2g), and a ratio of a volume of the first block is 20% to 80% by volume. In the formulas, Ris a hydrogen atom or an alkyl group, Ris a hydrogen atom or a methyl group, Ris an alkyl group which may have a silicon atom, a fluorine atom, a carboxy group, an amino group, a hydroxy group, or a phosphoric acid group, Ris a linear or branched alkylene group having 1 to 10 carbon atoms, which may have a hydroxy group, and Ris a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms 

A composition for forming a phase-separated structure contains a block copolymer having a block (b1) consisting of a repeating structure of a styrene unit and a block (b2) consisting of a repeating structure of a methyl methacrylate unit, in which the block (b2) is disposed at least at one terminal portion of the block copolymer, the block copolymer has a structure (e1) represented by General Formula (e1) at least at one main chain terminal, and the structure (e1) is bonded to the main chain terminal of the block (b2) disposed at a terminal portion of the block copolymer. Rerepresents a hydrocarbon group containing a hetero atom, and Re1 represents a hydrogen atom or a halogen atom. 

A method of producing a structure containing a phase-separated structure, including: a step of using a resin composition for forming a phase-separated structure including a block copolymer and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety to form a BCP layer () containing a block copolymer on a substrate (); and a step of vaporizing at least a part of the compound (IL), and phase-separating the BCP layer () to obtain a structure (') containing a phase-separated structure.

Method of producing structure containing phase-separated structure

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.

Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure

A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer composition including an organic solvent component (S) and a block copolymer in which a block of polystyrene or a polystyrene derivative is bonded to at least one kind of block to a substrate to form a layer containing the block copolymer; and phase-separating the layer containing the block. The value of an interaction distance Ra(MPa) between the Hansen solubility parameter of the organic solvent component (S) and the Hansen solubility parameter of polystyrene or the polystyrene derivative satisfying the following formula (1).4.1&#x2264;&#x2264;9&#x2003;&#x2003;(1)

Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer composition

A method of producing a structure containing a phase-separated structure, which includes mixing a block copolymer which includes a hydrophobic polymer block and a hydrophilic polymer block and is incapable of forming a phase-separated structure, with a homopolymer compatible with the hydrophilic polymer block or a homopolymer compatible with the hydrophobic polymer block.

Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being &#x2212;4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.

An undercoat agent including a block copolymer having a plurality of blocks bonded formed on a substrate. The undercoat agent contains a resin component that includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer. The method includes applying an undercoat agent to a substrate to form a layer containing the undercoat agent; forming a layer containing a block copolymer having multiple blocks bonded on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and selectively removing a phase containing at least one block of multiple blocks constituting the block copolymer.

Undercoat agent and method of forming pattern of layer containing block copolymer

A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X&#x2033; represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y&#x2033; and Z&#x2033; each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R&#x2033; represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6. 

A brush composition used for phase-separation of a layer containing a block copolymer on a substrate, the brush composition including a resin component (N), the resin component (N) containing a hydrophobic structural unit (Nx) and a hydrophilic structural unit (Ny), the amount of the structural unit (Ny) within the resin component (N) being 5 mol % or less.

Method of producing structure containing phase-separated structure utilizing a brush composition comprising PS-PMMA

A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer solution to a substrate to form a layer containing a block copolymer and having a film thickness of less than 100 nm; and phase-separating the layer containing the block copolymer, a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer.

The present invention relates to a composition including: a component (A) being a block copolymer including a block Pbonded to one, or two or more blocks incompatible with the block Pand whose etching selectivity to the block Pis greater than one; and a component (B) being at least one polymer selected from the group consisting of a random copolymer and a homopolymer, wherein the polymer of the component (B) is compatible with at least one block other than the block Pwithin the blocks constituting the block copolymer of the component (A), and is incompatible with the block P.

Block copolymer-containing composition and method of reducing pattern

A method of producing a structure containing a phase-separated structure, including applying a neutralization film to a substrate to form a layer of a neutralization film; applying a block copolymer having a plurality of polymers bonded thereto, and a weight average molecular weight of 150,000 or more to the layer of the neutralization film, so as to form a layer containing the block copolymer and having a coating film thickness of 23 nm or less; and phase-separating the layer containing the block copolymer.

Method of producing structure containing phase-separated structure, phase separated structure, and block copolymer composition

A method of producing a structure containing a phase-separated structure, including a step in which a layer including an Si-containing block copolymer having a plurality of blocks bonded is formed between guide patterns on a substrate; a step in which a solution of a top coat material is applied to the layer and the guide patterns so as to form a top coat film; and a step in which the layer including the Si-containing block copolymer and having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer; in which a solvent of the solution of the top coat material contains no basic substance.

Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern

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Kawasaki, Japan

Ken Miyagi